The Influence of Argon Cluster Ion Bombardment on the Characteristics of AlN Films on Glass-Ceramics and Si Substrates › Research Explorer

DOI

https://doi.org/10.3390/nano12040670
Final published version

Original language	English
Article number	670
Journal	Nanomaterials
Volume	12
Issue number	4
DOIs	https://doi.org/10.3390/nano12040670
Publication status	Published - 1 Feb 2022

OECD FOS+WOS

1.04.DY CHEMISTRY, MULTIDISCIPLINARY
2.05.PM MATERIALS SCIENCE, MULTIDISCIPLINARY
2.10.NS NANOSCIENCE & NANOTECHNOLOGY
1.03.UB PHYSICS, APPLIED

Research areas

Aluminum nitride, Gas cluster ion beam, Material characterization, Surface smoothing, Thin films

ID: 35518899