Peculiarities of the Processing of Polycrystalline AlN Films on Glass-Ceramic and Si Substrates by Argon Cluster Ions

Research output: Contribution to journal › Article › peer-review

Translated title of the contribution	Особенности обработки кластерными ионами аргона поликристаллических пленок AlN на подложках из ситалла и Si
Original language	English
Pages (from-to)	480-483
Number of pages	4
Journal	Journal of Surface Investigation
Volume	16
Issue number	4
DOIs	https://doi.org/10.1134/S1027451022040152
Publication status	Published - 3 Aug 2022

aluminum nitride, atomic force microscopy, cluster ion beam, etching, parameters of roughness, polycrystalline thin films, surface morphology, surface smoothing

ID: 36737899