Efficient nanopatterning of Ge surface induced by oblique argon cluster ion beam

In: Materials Letters, Vol. 368, 136710, 05.2024.

Research output: Contribution to journal › Article › peer-review

@article{9803d421509e4cd0813ea6ccf36e5982,

title = "Efficient nanopatterning of Ge surface induced by oblique argon cluster ion beam",

author = "Коробейщиков, {Николай Геннадьевич} and Николаев, {Иван Владимирович} and Лапега, {Алина Витальевна}",

year = "2024",

month = may,

doi = "10.1016/j.matlet.2024.136710",

language = "English",

volume = "368",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier",

}

TY - JOUR

T1 - Efficient nanopatterning of Ge surface induced by oblique argon cluster ion beam

AU - Коробейщиков, Николай Геннадьевич

AU - Николаев, Иван Владимирович

AU - Лапега, Алина Витальевна

PY - 2024/5

Y1 - 2024/5

U2 - 10.1016/j.matlet.2024.136710

DO - 10.1016/j.matlet.2024.136710

M3 - Article

VL - 368

JO - Materials Letters

JF - Materials Letters

SN - 0167-577X

M1 - 136710

ER -

ID: 60095384