Efficient nanopatterning of Ge surface induced by oblique argon cluster ion beam › Research Explorer

DOI

https://doi.org/10.1016/j.matlet.2024.136710
Final published version
Embargo ends: 01.06.2026

Original language	English
Article number	136710
Number of pages	4
Journal	Materials Letters
Volume	368
DOIs	https://doi.org/10.1016/j.matlet.2024.136710
Publication status	Published - 1 Aug 2024

Research areas

Gas cluster ion beam, Germanium, Ion sputtering, Nanoripples, Surface nanopatterning

OECD FOS+WOS

2.05.PM MATERIALS SCIENCE, MULTIDISCIPLINARY
1.03.UB PHYSICS, APPLIED

ID: 60095384