Translated title of the contributionCLUSTER ION TREATMENT OF THE SURFACE OF SINGLE-CRYSTAL SILICON AND GERMANIUM AT AN ANGLE OF 60°
Original languageRussian
Article number8
Pages (from-to)60-64
Number of pages5
JournalПоверхность. Рентгеновские, синхротронные и нейтронные исследования
Issue number2
DOIs
Publication statusPublished - 2025

    Research areas

  • NANOSTRUCTURING, SEMICONDUCTORS, SINGLE CRYSTALS, GAS CLUSTER, CLUSTER ION BEAM, ATOMIC FORCE MICROSCOPY, SURFACE MORPHOLOGY, SURFACE ROUGHNESS

    OECD FOS+WOS

  • 1.03.UB PHYSICS, APPLIED

ID: 68110429