Original languageEnglish
Pages (from-to)1223-1235
Number of pages13
JournalPlasma Chemistry and Plasma Processing
Volume42
Issue number6
Early online date21 Sept 2022
DOIs
Publication statusPublished - Nov 2022

    OECD FOS+WOS

  • 1.03 PHYSICAL SCIENCES AND ASTRONOMY
  • 2.04 CHEMICAL ENGINEERING
  • 1.04 CHEMICAL SCIENCES
  • 2.05 MATERIALS ENGINEERING

    Research areas

  • Gas cluster ion, MD simulation, Selective sputtering, Surface sputtering

ID: 37865532