Optical Properties of the SiO x (x < 2) Thin Films Obtained by Hydrogen Plasma Processing of Thermal Silicon Dioxide › Research Explorer

DOI

https://doi.org/10.1134/S0030400X20100173
Final published version

V. N. Kruchinin
T. V. Perevalov
V. Sh Aliev
R. M.Kh Iskhakzai
E. V. Spesivtsev
V. A. Gritsenko
V. A. Pustovarov

Original language	English
Pages (from-to)	1577-1582
Number of pages	6
Journal	Optics and Spectroscopy
Volume	128
Issue number	10
DOIs	https://doi.org/10.1134/S0030400X20100173
Publication status	Published - 1 Oct 2020

OECD FOS+WOS

Research areas

ellipsometry, photoluminescence, quantum-chemical modeling, silicon oxide, OXYGEN-DEFICIENT CENTERS, LUMINESCENCE, ELLIPSOMETRY

ID: 26004474