Comparative nanopatterning of single-component semiconductors using oblique argon cluster ion bombardment

https://doi.org/10.1016/j.mssp.2025.110016
Final published version
Embargo ends: 03.09.2027

Original language	English
Article number	110016
Number of pages	11
Journal	Materials Science in Semiconductor Processing
Volume	200
DOIs	https://doi.org/10.1016/j.mssp.2025.110016
Publication status	Published - Dec 2025

ID: 68964541