TY - JOUR

T1 - Single-shot selective femtosecond and picosecond infrared laser crystallization of an amorphous Ge/Si multilayer stack

AU - Volodin, V. A.

AU - Cheng, Yuzhu

AU - Bulgakov, A. V.

AU - Levy, Y.

AU - Beránek, J.

AU - Nagisetty, S. S.

AU - Zukerstein, M.

AU - Popov, A. A.

AU - Bulgakova, N. M.

N1 - We are grateful to G.K. Krivyakin for the HRTEM measurements and to the Center for Collective Use “VTAN” NSU for providing equipment for Raman spectroscopy and HRTEM image analysis. The study of V.A.V. and Y.C. was supported by the Ministry of Science and Higher Education of the Russian Federation, project No. 075-15-2020-797 (13.1902.21.0024). A.V.B., Y.L., J.B., M.Z., and N.M.B. acknowledge support of the European Regional Development Fund and the state budget of the Czech Republic (project BIATRI: No. CZ.02.1.01/0.0/0.0/15_003/0000445). J.B. acknowledges also support of the Grant Agency of the Czech Technical University in Prague, grant No. SGS22/188/OHK4/3T/14.

PY - 2023/6

Y1 - 2023/6

N2 - Pulsed laser crystallization is an efficient annealing technique to obtain polycrystalline silicon or germanium films on non-refractory substrates. This is important for creating “flexible electronics” and can also be used to fabricate thin-film solar cells. In this work, near- and mid-infrared femtosecond and picosecond laser pulses were used to crystallize a Ge/Si multilayer stack consisting of alternating amorphous thin films of silicon and germanium. The use of infrared radiation at wavelengths of 1030 and 1500 nm with photon energies lower than the optical absorption edge in amorphous silicon allowed obtaining selective crystallization of germanium layers with a single laser shot. The phase composition of the irradiated stack was investigated by the Raman scattering technique. Several non-ablative regimes of ultrashort-pulse laser crystallization were found, from partial crystallization of germanium without intermixing the Ge/Si layers to complete intermixing of the layers with formation of GexSi1-x solid alloys. The roles of single- and two-photon absorption, thermal and non-thermal (ultrafast) melting processes, and laser-induced stresses in selective pico- and femtosecond laser annealing are discussed. It is concluded that, due to a mismatch of the thermal expansion coefficients between the adjacent stack layers, efficient explosive solid-phase crystallization of the Ge layers is possible at relatively low temperatures, well below the melting point.

AB - Pulsed laser crystallization is an efficient annealing technique to obtain polycrystalline silicon or germanium films on non-refractory substrates. This is important for creating “flexible electronics” and can also be used to fabricate thin-film solar cells. In this work, near- and mid-infrared femtosecond and picosecond laser pulses were used to crystallize a Ge/Si multilayer stack consisting of alternating amorphous thin films of silicon and germanium. The use of infrared radiation at wavelengths of 1030 and 1500 nm with photon energies lower than the optical absorption edge in amorphous silicon allowed obtaining selective crystallization of germanium layers with a single laser shot. The phase composition of the irradiated stack was investigated by the Raman scattering technique. Several non-ablative regimes of ultrashort-pulse laser crystallization were found, from partial crystallization of germanium without intermixing the Ge/Si layers to complete intermixing of the layers with formation of GexSi1-x solid alloys. The roles of single- and two-photon absorption, thermal and non-thermal (ultrafast) melting processes, and laser-induced stresses in selective pico- and femtosecond laser annealing are discussed. It is concluded that, due to a mismatch of the thermal expansion coefficients between the adjacent stack layers, efficient explosive solid-phase crystallization of the Ge layers is possible at relatively low temperatures, well below the melting point.

KW - Explosive low-temperature crystallization

KW - Germanium/silicon multilayer stack

KW - Nonlinear light absorption

KW - Raman spectroscopy

KW - Selective crystallization

KW - Ultrashort infrared laser crystallization

UR - https://www.scopus.com/inward/record.url?eid=2-s2.0-85146431519&partnerID=40&md5=9c6097dc1d2f63526e7571839ff7eb51

UR - https://www.mendeley.com/catalogue/ca879444-0e23-30fe-8c17-77480260839d/

U2 - 10.1016/j.optlastec.2023.109161

DO - 10.1016/j.optlastec.2023.109161

M3 - Article

VL - 161

SP - 10

JO - Optics and Laser Technology

JF - Optics and Laser Technology

SN - 0030-3992

M1 - 109161

ER -