• T. V. Malin
  • D. S. Milakhin
  • I. A. Aleksandrov
  • V. E. Zemlyakov
  • V. I. Egorkin
  • A. A. Zaitsev
  • D. Yu Protasov
  • A. S. Kozhukhov
  • B. Ya Ber
  • D. Yu Kazantsev
  • V. G. Mansurov
  • K. S. Zhuravlev
Original languageEnglish
Pages (from-to)761-764
Number of pages4
JournalTechnical Physics Letters
Volume45
Issue number8
DOIs
Publication statusPublished - 1 Aug 2019

    Research areas

  • AlGaN/GaN, background impurities, GaN, high-electron-mobility transistor, intrinsic point defects, NH–MBE, SAPPHIRE, CARBON, GROWTH, NH3-MBE, AlGaN

    OECD FOS+WOS

ID: 21464753