Tackling residual tensile stress in AlN-on-Si nucleation layers via the controlled Si(111) surface nitridation › Research Explorer

DOI

https://doi.org/10.1016/j.surfin.2024.104817
Final published version

Denis Milakhin
Timur Malin
Vladimir Mansurov
Yan Maidebura
Dmitriy Bashkatov
Ilya Milekhin
Sergey Goryainov
Vladimir Volodin
Ivan Loshkarev
Vladimir Vdovin
Anton Gutakovskii
Sergei Ponomarev
Konstantin Zhuravlev

Original language	English
Article number	104817
Number of pages	14
Journal	Surfaces and Interfaces
Volume	51
DOIs	https://doi.org/10.1016/j.surfin.2024.104817
Publication status	Published - 23 Jul 2024

OECD FOS+WOS

ID: 60830386