Structure of Hf 0.9 La 0.1 O 2 Ferroelectric Films Obtained by the Atomic Layer Deposition › Research Explorer

DOI

https://doi.org/10.1134/S0021364019020115
Final published version

T. V. Perevalov
V. A. Gritsenko
A. K. Gutakovskii
I. P. Prosvirin

Original language	English
Pages (from-to)	116-120
Number of pages	5
Journal	JETP Letters
Volume	109
Issue number	2
DOIs	https://doi.org/10.1134/S0021364019020115
Publication status	Published - 1 Jan 2019

OECD FOS+WOS

ID: 19647513