Research output: Contribution to journal › Article › peer-review
Raman scattering study of nanoscale Mo/Si and Mo/Be periodic multilayer structures. / Kumar, Niranjan; Volodin, Vladimir A.; Smertin, Ruslan M. et al.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 38, No. 6, 063408, 01.12.2020.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Raman scattering study of nanoscale Mo/Si and Mo/Be periodic multilayer structures
AU - Kumar, Niranjan
AU - Volodin, Vladimir A.
AU - Smertin, Ruslan M.
AU - Yunin, Pavel A.
AU - Polkovnoikov, Vladimir N.
AU - Panda, Kalpataru
AU - Nechay, Andrey N.
AU - Chkhalo, Nikolay I.
N1 - Publisher Copyright: © 2020 Author(s). Copyright: Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2020/12/1
Y1 - 2020/12/1
N2 - Investigation of the microstructure and phase analysis of the periodic Mo/Si and Mo/Be multilayers are essential for depositing high reflective multilayers that operate at soft x-ray to extreme ultraviolet radiations. Raman spectroscopy revealed the presence of an amorphous phase of silicon (Si) in the Mo/Si multilayers. Furthermore, the disorder of the amorphous Si phase was increased with decreasing the periodic thickness of the Si layers in the nanoscale Mo/Si multilayers. The polycrystalline Mo periodic layers coexisted with the amorphous silicon layers in the Mo/Si multilayers. In contrast, both the Mo and Be layers in the Mo/Be periodic multilayers were condensed into the polycrystalline phases. At higher annealing temperatures, the polycrystalline and amorphous phases in both the Mo/Si and Mo/Be multilayers were destroyed due to the extensive interdiffusion process. However, the amorphous Si phase was partially preserved due to the formation of crystalline intermetallic h-MoSi2 and t-MoSi2 phases, for critically thicker Si layers in periodic Mo/Si multilayers.
AB - Investigation of the microstructure and phase analysis of the periodic Mo/Si and Mo/Be multilayers are essential for depositing high reflective multilayers that operate at soft x-ray to extreme ultraviolet radiations. Raman spectroscopy revealed the presence of an amorphous phase of silicon (Si) in the Mo/Si multilayers. Furthermore, the disorder of the amorphous Si phase was increased with decreasing the periodic thickness of the Si layers in the nanoscale Mo/Si multilayers. The polycrystalline Mo periodic layers coexisted with the amorphous silicon layers in the Mo/Si multilayers. In contrast, both the Mo and Be layers in the Mo/Be periodic multilayers were condensed into the polycrystalline phases. At higher annealing temperatures, the polycrystalline and amorphous phases in both the Mo/Si and Mo/Be multilayers were destroyed due to the extensive interdiffusion process. However, the amorphous Si phase was partially preserved due to the formation of crystalline intermetallic h-MoSi2 and t-MoSi2 phases, for critically thicker Si layers in periodic Mo/Si multilayers.
KW - SOFT-X-RAY
KW - PHASE-FORMATION
KW - A-SI
KW - MIRRORS
KW - BERYLLIUM
KW - SPECTRA
KW - REFLECTIVITY
KW - BARRIER
KW - MICROSTRUCTURE
KW - LITHOGRAPHY
UR - http://www.scopus.com/inward/record.url?scp=85093986242&partnerID=8YFLogxK
U2 - 10.1116/6.0000408
DO - 10.1116/6.0000408
M3 - Article
AN - SCOPUS:85093986242
VL - 38
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SN - 0734-2101
IS - 6
M1 - 063408
ER -
ID: 25862386