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Optical Properties of TiO₂ Films Deposited by Reactive Electron Beam Sputtering

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DOI

https://doi.org/10.1007/s11664-017-5552-3
Final published version

V. N. Kruchinin
T. V. Perevalov
V. V. Atuchin
V. A. Gritsenko
A. I. Komonov
I. V. Korolkov
L. D. Pokrovsky
Cheng Wei Shih
Albert Chin

Original language	English
Pages (from-to)	6089-6095
Number of pages	7
Journal	Journal of Electronic Materials
Volume	46
Issue number	10
DOIs	https://doi.org/10.1007/s11664-017-5552-3
Publication status	Published - 1 Oct 2017

Research areas

AFM, film, optical constant, RHEED, spectroscopic ellipsometry, TiO, THIN-FILMS, SILICON, THERMAL-OXIDATION, DIELECTRICS, RUTILE TIO2, SURFACE, ANATASE, OXIDES, ABSORPTION, TITANIUM-DIOXIDE, TiO2

OECD FOS+WOS

ID: 9078860