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Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering. / Kruchinin, V. N.; Perevalov, T. V.; Atuchin, V. V. et al.

In: Journal of Electronic Materials, Vol. 46, No. 10, 01.10.2017, p. 6089-6095.

Research output: Contribution to journal › Article › peer-review

Harvard

Kruchinin, VN, Perevalov, TV, Atuchin, VV, Gritsenko, VA, Komonov, AI, Korolkov, IV, Pokrovsky, LD, Shih, CW & Chin, A 2017, 'Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering', Journal of Electronic Materials, vol. 46, no. 10, pp. 6089-6095. https://doi.org/10.1007/s11664-017-5552-3

APA

Kruchinin, V. N., Perevalov, T. V., Atuchin, V. V., Gritsenko, V. A., Komonov, A. I., Korolkov, I. V., Pokrovsky, L. D., Shih, C. W., & Chin, A. (2017). Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering. Journal of Electronic Materials, 46(10), 6089-6095. https://doi.org/10.1007/s11664-017-5552-3

Vancouver

Kruchinin VN, Perevalov TV, Atuchin VV, Gritsenko VA, Komonov AI, Korolkov IV et al. Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering. Journal of Electronic Materials. 2017 Oct 1;46(10):6089-6095. doi: 10.1007/s11664-017-5552-3

Author

Kruchinin, V. N. ; Perevalov, T. V. ; Atuchin, V. V. et al. / Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering. In: Journal of Electronic Materials. 2017 ; Vol. 46, No. 10. pp. 6089-6095.

BibTeX

@article{92203d561c4b41cbb97720f964c781b2,
title = "Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering",
abstract = "Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc–Lorentz model by SE in the photon energy range of E = 1.12–4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of Eg ≈ 3.44 eV.",
keywords = "AFM, film, optical constant, RHEED, spectroscopic ellipsometry, TiO, THIN-FILMS, SILICON, THERMAL-OXIDATION, DIELECTRICS, RUTILE TIO2, SURFACE, ANATASE, OXIDES, ABSORPTION, TITANIUM-DIOXIDE, TiO2",
author = "Kruchinin, {V. N.} and Perevalov, {T. V.} and Atuchin, {V. V.} and Gritsenko, {V. A.} and Komonov, {A. I.} and Korolkov, {I. V.} and Pokrovsky, {L. D.} and Shih, {Cheng Wei} and Albert Chin",
year = "2017",
month = oct,
day = "1",
doi = "10.1007/s11664-017-5552-3",
language = "English",
volume = "46",
pages = "6089--6095",
journal = "Journal of Electronic Materials",
issn = "0361-5235",
publisher = "Springer New York",
number = "10",

}

RIS

TY - JOUR

T1 - Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering

AU - Kruchinin, V. N.

AU - Perevalov, T. V.

AU - Atuchin, V. V.

AU - Gritsenko, V. A.

AU - Komonov, A. I.

AU - Korolkov, I. V.

AU - Pokrovsky, L. D.

AU - Shih, Cheng Wei

AU - Chin, Albert

PY - 2017/10/1

Y1 - 2017/10/1

N2 - Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc–Lorentz model by SE in the photon energy range of E = 1.12–4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of Eg ≈ 3.44 eV.

AB - Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc–Lorentz model by SE in the photon energy range of E = 1.12–4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of Eg ≈ 3.44 eV.

KW - AFM

KW - film

KW - optical constant

KW - RHEED

KW - spectroscopic ellipsometry

KW - TiO

KW - THIN-FILMS

KW - SILICON

KW - THERMAL-OXIDATION

KW - DIELECTRICS

KW - RUTILE TIO2

KW - SURFACE

KW - ANATASE

KW - OXIDES

KW - ABSORPTION

KW - TITANIUM-DIOXIDE

KW - TiO2

UR - http://www.scopus.com/inward/record.url?scp=85019218849&partnerID=8YFLogxK

U2 - 10.1007/s11664-017-5552-3

DO - 10.1007/s11664-017-5552-3

M3 - Article

AN - SCOPUS:85019218849

VL - 46

SP - 6089

EP - 6095

JO - Journal of Electronic Materials

JF - Journal of Electronic Materials

SN - 0361-5235

IS - 10

ER -

ID: 9078860