MOCVD growth and study of magnetic Co films › Research Explorer

DOI

https://doi.org/10.1179/1743294414Y.0000000424
Final published version

S. I. Dorovskikh
R. R. Hairullin
S. V. Sysoev
V. V. Kriventsov
A. V. Panin
Y. V. Shubin
N. B. Morozova
N. V. Gelfond
S. V. Korenev

Original language	English
Pages (from-to)	8-14
Number of pages	7
Journal	Surface Engineering
Volume	32
Issue number	1
DOIs	https://doi.org/10.1179/1743294414Y.0000000424
Publication status	Published - 2016

OECD FOS+WOS

Research areas

Co films, Co precursor, Magnetic characteristics, MOCVD, Vapour pressure

ID: 25401946