Laser annealing of epitaxial CaF2 films on Si › Research Explorer

DOI

https://doi.org/10.1016/j.tsf.2021.138898
Final published version

A. V. Dvurechenskii
Zh V. Smagina
V. A. Volodin
A. V. Kacyuba
V. A. Zinovyev
G. D. Ivlev
S. L. Prakopyeu

Original language	English
Article number	138898
Journal	Thin Solid Films
Volume	735
DOIs	https://doi.org/10.1016/j.tsf.2021.138898
Publication status	Published - 1 Oct 2021

Research areas

Calcium fluoride, Epitaxy, Laser annealing, Silicon

OECD FOS+WOS

2.05 MATERIALS ENGINEERING
1.03 PHYSICAL SCIENCES AND ASTRONOMY

ID: 34082905