Research output: Contribution to journal › Article › peer-review
Electronic structure and nanoscale potential fluctuations in strongly nonstoichiometric PECVD SiOx. / Perevalov, T. V.; Volodin, V. A.; Kamaev, G. N. et al.
In: Journal of Non-Crystalline Solids, Vol. 529, 119796, 01.02.2020.Research output: Contribution to journal › Article › peer-review
}
TY - JOUR
T1 - Electronic structure and nanoscale potential fluctuations in strongly nonstoichiometric PECVD SiOx
AU - Perevalov, T. V.
AU - Volodin, V. A.
AU - Kamaev, G. N.
AU - Krivyakin, G. K.
AU - Gritsenko, V. A.
AU - Prosvirin, I. P.
PY - 2020/2/1
Y1 - 2020/2/1
N2 - The electronic structures of SiOx:H films synthesized by plasma-enhanced chemical vapor deposition on silicon and glass substrates were studied. The film stoichiometric parameter x varied in the range from 0.57 to 2 depending on the oxygen supply to the reactor conditions. According to XPS, Raman scattering and high-resolution electron microscopy, a core-shell model of the a-SiOx:H structure was applied. According to this model, the films consist of silicon suboxide SiOy, in which clusters of different compositions are introduced — from amorphous silicon to silicon oxide — with a characteristic size of 2–10 nm. The SiOx:H energy diagram was constructed. The nanoscale potential fluctuations model, according to which Si nanoclusters are potential wells for electrons and holes in SiOx, is proposed. The data obtained are important for the correct interpretation of the charge transport in a-SiOx:H films, and they are important for the development of nonvolatile memory elements on their basis.
AB - The electronic structures of SiOx:H films synthesized by plasma-enhanced chemical vapor deposition on silicon and glass substrates were studied. The film stoichiometric parameter x varied in the range from 0.57 to 2 depending on the oxygen supply to the reactor conditions. According to XPS, Raman scattering and high-resolution electron microscopy, a core-shell model of the a-SiOx:H structure was applied. According to this model, the films consist of silicon suboxide SiOy, in which clusters of different compositions are introduced — from amorphous silicon to silicon oxide — with a characteristic size of 2–10 nm. The SiOx:H energy diagram was constructed. The nanoscale potential fluctuations model, according to which Si nanoclusters are potential wells for electrons and holes in SiOx, is proposed. The data obtained are important for the correct interpretation of the charge transport in a-SiOx:H films, and they are important for the development of nonvolatile memory elements on their basis.
KW - Dielectric
KW - FTIR
KW - HRTEM
KW - PECVD
KW - Raman scattering
KW - SiO
KW - XPS
KW - RAMAN-SPECTRA
KW - SILICON QUANTUM DOTS
KW - AMORPHOUS SI
KW - QUANTITATIVE-ANALYSIS
KW - HYDROGEN
KW - SiO2
UR - http://www.scopus.com/inward/record.url?scp=85076261687&partnerID=8YFLogxK
U2 - 10.1016/j.jnoncrysol.2019.119796
DO - 10.1016/j.jnoncrysol.2019.119796
M3 - Article
AN - SCOPUS:85076261687
VL - 529
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
SN - 0022-3093
M1 - 119796
ER -
ID: 22837979