Electron-Beam Radiation Effects at the Molecular-Beam Epitaxial Growth of CaF2 Film on Silicon. / Dvurechenskii, A. V.; Kacyuba, A. V.; Kamaev, G. N. et al.
In: Bulletin of the Russian Academy of Sciences: Physics, Vol. 87, No. 6, 2023, p. 809-812.Research output: Contribution to journal › Article › peer-review
}
TY - JOUR
T1 - Electron-Beam Radiation Effects at the Molecular-Beam Epitaxial Growth of CaF2 Film on Silicon
AU - Dvurechenskii, A. V.
AU - Kacyuba, A. V.
AU - Kamaev, G. N.
AU - Volodin, V. A.
N1 - FUNDING: The research was supported by the Russian Foundation for Basic Research and “Rosatom” State Corporation, project no. 20-21-00028.
PY - 2023
Y1 - 2023
N2 - The formation of CaSi2 films on Si(111) by molecular-beam epitaxy (MBE) under fast electron irradiation of CaF2 layers is investigated in the article. The mechanisms and regularities of the changes in the structure and elemental composition of the CaF2/CaSi2/Si system under the influence of an electron beam are established in the present contribution, both directly during the CaF2 growth and after the CaF2 film formation. The method of solid-phase extraction (SPE) is proposed with a subsequent Si sputtering during the electron-beam radiation of the CaF2 film, which leads to a decrease in the CaSi2 film surface roughness and defects density.
AB - The formation of CaSi2 films on Si(111) by molecular-beam epitaxy (MBE) under fast electron irradiation of CaF2 layers is investigated in the article. The mechanisms and regularities of the changes in the structure and elemental composition of the CaF2/CaSi2/Si system under the influence of an electron beam are established in the present contribution, both directly during the CaF2 growth and after the CaF2 film formation. The method of solid-phase extraction (SPE) is proposed with a subsequent Si sputtering during the electron-beam radiation of the CaF2 film, which leads to a decrease in the CaSi2 film surface roughness and defects density.
KW - calcium compounds
KW - crystal structure
KW - electron-beam radiation
KW - molecular-beam epitaxy
KW - nanostructures
KW - silicon
UR - https://www.mendeley.com/catalogue/bf71567b-8954-3034-be29-9756d0599b04/
U2 - 10.3103/S106287382370199X
DO - 10.3103/S106287382370199X
M3 - Article
VL - 87
SP - 809
EP - 812
JO - Bulletin of the Russian Academy of Sciences: Physics
JF - Bulletin of the Russian Academy of Sciences: Physics
SN - 1062-8738
IS - 6
ER -
ID: 55446371