Original languageEnglish
Pages (from-to)10-14
Number of pages5
JournalApplied Surface Science
Volume465
DOIs
Publication statusPublished - 28 Jan 2019

    OECD FOS+WOS

    Research areas

  • Electromigration, Ge growth on Si(1 1 1), Nanostructures, Si/Ge heterostructures, Ge growth on Si(111), INSTABILITY, SUBLIMATION, GRAPHENE, SEMICONDUCTOR SURFACES, ANISOTROPY, GERMANIUM, SILICON NANOSTRUCTURES, SIGE ISLAND FORMATION, GROWTH, SCANNING-TUNNELING-MICROSCOPY

ID: 16632320