Atomic and electronic structure of ferroelectric La-doped HfO2 films › Research Explorer

DOI

https://doi.org/10.1088/2053-1591/aaf436
Final published version

T. V. Perevalov
A. K. Gutakovskii
V. N. Kruchinin
V. A. Gritsenko
I. P. Prosvirin

Original language	English
Article number	036403
Number of pages	7
Journal	Materials Research Express
Volume	6
Issue number	3
DOIs	https://doi.org/10.1088/2053-1591/aaf436
Publication status	Published - 1 Mar 2019

Research areas

DFT, FRAM, Hafnium oxide, HRTEM, oxygen vacancy, photoelectron spectra, specroellipsometry, THIN-FILMS, OXIDE, hafnium oxide, HAFNIA

OECD FOS+WOS

ID: 18064191