Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Optical Properties of Nonstoichiometric Silicon Oxide SiOx(x < 2). / Kruchinin, V. N.; Perevalov, T. V.; Kamaev, G. N. и др.
в: Optics and Spectroscopy, Том 127, № 5, 01.11.2019, стр. 836-840.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Optical Properties of Nonstoichiometric Silicon Oxide SiOx(x < 2)
AU - Kruchinin, V. N.
AU - Perevalov, T. V.
AU - Kamaev, G. N.
AU - Rykhlitskii, S. V.
AU - Gritsenko, V. A.
PY - 2019/11/1
Y1 - 2019/11/1
N2 - The optical properties of amorphous nonstoichiometric silicon oxide (SiOx) films of variable composition (x = 0.62–1.92) formed by plasma-enhanced chemical vapor deposition are studied in the spectral range of 1.12–4.96 eV. Spectral ellipsometry showed that the refractive index dispersion character allows one to assign the formed SiOx films to silicon-like films, dielectrics, or intermediate-conductivity-type films depending on the content of oxygen in the gas phase during synthesis. A model of the SiOx structure for ab initio calculations is proposed and describes well the experimental optical spectra. Ab initio calculations of the dependences of the SiOx refractive index and band gap on stoichiometry parameter x are performed.
AB - The optical properties of amorphous nonstoichiometric silicon oxide (SiOx) films of variable composition (x = 0.62–1.92) formed by plasma-enhanced chemical vapor deposition are studied in the spectral range of 1.12–4.96 eV. Spectral ellipsometry showed that the refractive index dispersion character allows one to assign the formed SiOx films to silicon-like films, dielectrics, or intermediate-conductivity-type films depending on the content of oxygen in the gas phase during synthesis. A model of the SiOx structure for ab initio calculations is proposed and describes well the experimental optical spectra. Ab initio calculations of the dependences of the SiOx refractive index and band gap on stoichiometry parameter x are performed.
KW - ab initio modeling
KW - ellipsometry
KW - optical properties
KW - silicon oxide
UR - http://www.scopus.com/inward/record.url?scp=85077051455&partnerID=8YFLogxK
U2 - 10.1134/S0030400X19110183
DO - 10.1134/S0030400X19110183
M3 - Article
AN - SCOPUS:85077051455
VL - 127
SP - 836
EP - 840
JO - Optics and Spectroscopy (English translation of Optika i Spektroskopiya)
JF - Optics and Spectroscopy (English translation of Optika i Spektroskopiya)
SN - 0030-400X
IS - 5
ER -
ID: 22979414