Standard

Low-defect-density SnSe2 films nucleated via thin layer crystallization. / Ponomarev, S. A.; Zakhozhev, K. E.; Rogilo, D. I. и др.

в: Journal of Crystal Growth, Том 631, 127615, 01.04.2024.

Результаты исследований: Научные публикации в периодических изданияхстатьяРецензирование

Harvard

Ponomarev, SA, Zakhozhev, KE, Rogilo, DI, Gutakovsky, AK, Kurus, NN, Kokh, KA, Sheglov, DV, Milekhin, AG & Latyshev, AV 2024, 'Low-defect-density SnSe2 films nucleated via thin layer crystallization', Journal of Crystal Growth, Том. 631, 127615. https://doi.org/10.1016/j.jcrysgro.2024.127615

APA

Ponomarev, S. A., Zakhozhev, K. E., Rogilo, D. I., Gutakovsky, A. K., Kurus, N. N., Kokh, K. A., Sheglov, D. V., Milekhin, A. G., & Latyshev, A. V. (2024). Low-defect-density SnSe2 films nucleated via thin layer crystallization. Journal of Crystal Growth, 631, [127615]. https://doi.org/10.1016/j.jcrysgro.2024.127615

Vancouver

Ponomarev SA, Zakhozhev KE, Rogilo DI, Gutakovsky AK, Kurus NN, Kokh KA и др. Low-defect-density SnSe2 films nucleated via thin layer crystallization. Journal of Crystal Growth. 2024 апр. 1;631:127615. doi: 10.1016/j.jcrysgro.2024.127615

Author

Ponomarev, S. A. ; Zakhozhev, K. E. ; Rogilo, D. I. и др. / Low-defect-density SnSe2 films nucleated via thin layer crystallization. в: Journal of Crystal Growth. 2024 ; Том 631.

BibTeX

@article{78cc020013884b15beadc1a5c8ae5e91,
title = "Low-defect-density SnSe2 films nucleated via thin layer crystallization",
abstract = "We have studied the structural and morphological features of SnSe2 films grown on Si(111) and Bi2Se3(0001) surfaces in an in situ reflection electron microscope. On both substrates, the SnSe2 growth started at 100 °C as an amorphous layer, and when thickness reached 1 nm, crystallized by raising the growth temperature to 250 °C without interruption of Sn and Se fluxes. The introduction of this growth-initiating stage has decreased the concentration of screw dislocations on films{\textquoteright} surfaces to ∼18 and ∼2 μm−2 for the Si(111) and Bi2Se3(0001) substrates, respectively. High-resolution transmission electron microscopy investigation has shown that the layered SnSe2 film has a hexagonal lattice structure corresponding to the space group P3¯m1 (no. 164) with lattice parameters a = 0.38 nm and c = 0.62 nm. Raman spectroscopy has shown vibrational modes corresponding to the 1T-SnSe2 phase. We have shown that the decrease in Se:Sn flux ratio switches growth mode from Frank—van der Merwe type SnSe2 epitaxy to Volmer—Weber type nucleation of SnSe 3D islands.",
keywords = "A1. Adsorption, A1. Atomic force microscopy, A1. Defect engineering, A1. Surfaces, A3. Molecular beam epitaxy, A3. van der Waals epitaxy",
author = "Ponomarev, {S. A.} and Zakhozhev, {K. E.} and Rogilo, {D. I.} and Gutakovsky, {A. K.} and Kurus, {N. N.} and Kokh, {K. A.} and Sheglov, {D. V.} and Milekhin, {A. G.} and Latyshev, {A. V.}",
note = "This research was performed on the equipment of CKP Nanostruktury. Experiments on the Si(111) surface were supported by the State Government Task (project no. FWGW-2022-0007 ), and experiments on the Bi 2 Se 3 (0001) surface were financially supported by the Russian Science Foundation (grant no. 22-72-10124 ).",
year = "2024",
month = apr,
day = "1",
doi = "10.1016/j.jcrysgro.2024.127615",
language = "English",
volume = "631",
journal = "Journal of Crystal Growth",
issn = "0022-0248",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Low-defect-density SnSe2 films nucleated via thin layer crystallization

AU - Ponomarev, S. A.

AU - Zakhozhev, K. E.

AU - Rogilo, D. I.

AU - Gutakovsky, A. K.

AU - Kurus, N. N.

AU - Kokh, K. A.

AU - Sheglov, D. V.

AU - Milekhin, A. G.

AU - Latyshev, A. V.

N1 - This research was performed on the equipment of CKP Nanostruktury. Experiments on the Si(111) surface were supported by the State Government Task (project no. FWGW-2022-0007 ), and experiments on the Bi 2 Se 3 (0001) surface were financially supported by the Russian Science Foundation (grant no. 22-72-10124 ).

PY - 2024/4/1

Y1 - 2024/4/1

N2 - We have studied the structural and morphological features of SnSe2 films grown on Si(111) and Bi2Se3(0001) surfaces in an in situ reflection electron microscope. On both substrates, the SnSe2 growth started at 100 °C as an amorphous layer, and when thickness reached 1 nm, crystallized by raising the growth temperature to 250 °C without interruption of Sn and Se fluxes. The introduction of this growth-initiating stage has decreased the concentration of screw dislocations on films’ surfaces to ∼18 and ∼2 μm−2 for the Si(111) and Bi2Se3(0001) substrates, respectively. High-resolution transmission electron microscopy investigation has shown that the layered SnSe2 film has a hexagonal lattice structure corresponding to the space group P3¯m1 (no. 164) with lattice parameters a = 0.38 nm and c = 0.62 nm. Raman spectroscopy has shown vibrational modes corresponding to the 1T-SnSe2 phase. We have shown that the decrease in Se:Sn flux ratio switches growth mode from Frank—van der Merwe type SnSe2 epitaxy to Volmer—Weber type nucleation of SnSe 3D islands.

AB - We have studied the structural and morphological features of SnSe2 films grown on Si(111) and Bi2Se3(0001) surfaces in an in situ reflection electron microscope. On both substrates, the SnSe2 growth started at 100 °C as an amorphous layer, and when thickness reached 1 nm, crystallized by raising the growth temperature to 250 °C without interruption of Sn and Se fluxes. The introduction of this growth-initiating stage has decreased the concentration of screw dislocations on films’ surfaces to ∼18 and ∼2 μm−2 for the Si(111) and Bi2Se3(0001) substrates, respectively. High-resolution transmission electron microscopy investigation has shown that the layered SnSe2 film has a hexagonal lattice structure corresponding to the space group P3¯m1 (no. 164) with lattice parameters a = 0.38 nm and c = 0.62 nm. Raman spectroscopy has shown vibrational modes corresponding to the 1T-SnSe2 phase. We have shown that the decrease in Se:Sn flux ratio switches growth mode from Frank—van der Merwe type SnSe2 epitaxy to Volmer—Weber type nucleation of SnSe 3D islands.

KW - A1. Adsorption

KW - A1. Atomic force microscopy

KW - A1. Defect engineering

KW - A1. Surfaces

KW - A3. Molecular beam epitaxy

KW - A3. van der Waals epitaxy

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85184996971&origin=inward&txGid=e3c5dbadc43326e05d5489c1ec7ec510

UR - https://www.mendeley.com/catalogue/b1cf09ef-bc01-31cf-acbb-36d36912c0a0/

U2 - 10.1016/j.jcrysgro.2024.127615

DO - 10.1016/j.jcrysgro.2024.127615

M3 - Article

VL - 631

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

SN - 0022-0248

M1 - 127615

ER -

ID: 61085307