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Light sensitive memristors based on GeSixOy films with Ge nanoclusters. / Volodin, Vladimir A.; Kamaev, Gennady N.; Yushkov, Ivan D. и др.

International Conference on Micro- and Nano-Electronics 2021. ред. / Vladimir F. Lukichev; Konstantin V. Rudenko. SPIE, 2022. 121570A (Proceedings of SPIE - The International Society for Optical Engineering; Том 12157).

Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференцийстатья в сборнике материалов конференциинаучнаяРецензирование

Harvard

Volodin, VA, Kamaev, GN, Yushkov, ID, Krivyakin, GK, Cherkova, SG & Vergnat, M 2022, Light sensitive memristors based on GeSixOy films with Ge nanoclusters. в VF Lukichev & KV Rudenko (ред.), International Conference on Micro- and Nano-Electronics 2021., 121570A, Proceedings of SPIE - The International Society for Optical Engineering, Том. 12157, SPIE, 14th International Conference on Micro- and Nano-Electronics 2021, ICMNE 2021, Zvenigorod, Российская Федерация, 04.10.2021. https://doi.org/10.1117/12.2622642

APA

Volodin, V. A., Kamaev, G. N., Yushkov, I. D., Krivyakin, G. K., Cherkova, S. G., & Vergnat, M. (2022). Light sensitive memristors based on GeSixOy films with Ge nanoclusters. в V. F. Lukichev, & K. V. Rudenko (Ред.), International Conference on Micro- and Nano-Electronics 2021 [121570A] (Proceedings of SPIE - The International Society for Optical Engineering; Том 12157). SPIE. https://doi.org/10.1117/12.2622642

Vancouver

Volodin VA, Kamaev GN, Yushkov ID, Krivyakin GK, Cherkova SG, Vergnat M. Light sensitive memristors based on GeSixOy films with Ge nanoclusters. в Lukichev VF, Rudenko KV, Редакторы, International Conference on Micro- and Nano-Electronics 2021. SPIE. 2022. 121570A. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2622642

Author

Volodin, Vladimir A. ; Kamaev, Gennady N. ; Yushkov, Ivan D. и др. / Light sensitive memristors based on GeSixOy films with Ge nanoclusters. International Conference on Micro- and Nano-Electronics 2021. Редактор / Vladimir F. Lukichev ; Konstantin V. Rudenko. SPIE, 2022. (Proceedings of SPIE - The International Society for Optical Engineering).

BibTeX

@inproceedings{b0d7c85e486e4e228dc2f7d68ebd421d,
title = "Light sensitive memristors based on GeSixOy films with Ge nanoclusters",
abstract = "For the development of information technology, more and more memory arrays are needed. Recently, memristors have been the most promising candidates for the creation of modern universal memory. The possibility of light stimulated resistive switching (RS) is promising for creating optical computers, technical vision and neuron networks. The studied SixGeyOz solid alloys films (~50-65 nm) were obtained by simultaneous evaporation of GeO2 and SiO2 (or SiO) powders in high vacuum (10-8 Torr) and deposition onto n+-type, p+-type Si(001), and on Al/SiO2/Si(001) heated up to 100°C. The transparent indium tin oxide (ITO) contacts were used as top electrode. It was found, that as-deposited GeOx[SiO](1-x) films contain amorphous Ge (a-Ge) nanoclusters. The furnace annealing at temperature 500 oC lead to further forming of a-Ge clusters in both types of the films. Reversible (up to several thousand cycles) RS from high resistance state (HRS) to low resistance state (LRS) (memristor effect) were observed for the semiconductor-dielectric-metal structures, namely p+-Si (or n+-Si)/GeO[SiO2] (or GeO[SiO])/ITO structures (MIS structures) in air atmosphere. Both negative and positive photoconductivity was observed in the annealed MIS structure when both negative/positive voltage biases were applied to the top ITO electrode. This is possibly due to light-stimulated recharging of holes from a-Ge nanoclusters, which act as deep traps. The effects of light-induced RS was observed for annealed MIS structures based on GeO[SiO] films with a-Ge nanoclusters. These results are promising for creation of photomemristors and optoelectronic devices combining the properties of a memristor.",
keywords = "Germanium nanoclusters, Memristors, Negative photoconductivity, Nonstoichiometric germanium silicate glass, Photomemristors",
author = "Volodin, {Vladimir A.} and Kamaev, {Gennady N.} and Yushkov, {Ivan D.} and Krivyakin, {Gregory K.} and Cherkova, {Svetlana G.} and Michel Vergnat",
note = "Funding Information: The study was supported by Russian Foundation for Basic Research (project No. 19-07-00367). Publisher Copyright: {\textcopyright} 2022 SPIE.; 14th International Conference on Micro- and Nano-Electronics 2021, ICMNE 2021 ; Conference date: 04-10-2021 Through 08-10-2021",
year = "2022",
month = jan,
day = "31",
doi = "10.1117/12.2622642",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Lukichev, {Vladimir F.} and Rudenko, {Konstantin V.}",
booktitle = "International Conference on Micro- and Nano-Electronics 2021",
address = "United States",

}

RIS

TY - GEN

T1 - Light sensitive memristors based on GeSixOy films with Ge nanoclusters

AU - Volodin, Vladimir A.

AU - Kamaev, Gennady N.

AU - Yushkov, Ivan D.

AU - Krivyakin, Gregory K.

AU - Cherkova, Svetlana G.

AU - Vergnat, Michel

N1 - Funding Information: The study was supported by Russian Foundation for Basic Research (project No. 19-07-00367). Publisher Copyright: © 2022 SPIE.

PY - 2022/1/31

Y1 - 2022/1/31

N2 - For the development of information technology, more and more memory arrays are needed. Recently, memristors have been the most promising candidates for the creation of modern universal memory. The possibility of light stimulated resistive switching (RS) is promising for creating optical computers, technical vision and neuron networks. The studied SixGeyOz solid alloys films (~50-65 nm) were obtained by simultaneous evaporation of GeO2 and SiO2 (or SiO) powders in high vacuum (10-8 Torr) and deposition onto n+-type, p+-type Si(001), and on Al/SiO2/Si(001) heated up to 100°C. The transparent indium tin oxide (ITO) contacts were used as top electrode. It was found, that as-deposited GeOx[SiO](1-x) films contain amorphous Ge (a-Ge) nanoclusters. The furnace annealing at temperature 500 oC lead to further forming of a-Ge clusters in both types of the films. Reversible (up to several thousand cycles) RS from high resistance state (HRS) to low resistance state (LRS) (memristor effect) were observed for the semiconductor-dielectric-metal structures, namely p+-Si (or n+-Si)/GeO[SiO2] (or GeO[SiO])/ITO structures (MIS structures) in air atmosphere. Both negative and positive photoconductivity was observed in the annealed MIS structure when both negative/positive voltage biases were applied to the top ITO electrode. This is possibly due to light-stimulated recharging of holes from a-Ge nanoclusters, which act as deep traps. The effects of light-induced RS was observed for annealed MIS structures based on GeO[SiO] films with a-Ge nanoclusters. These results are promising for creation of photomemristors and optoelectronic devices combining the properties of a memristor.

AB - For the development of information technology, more and more memory arrays are needed. Recently, memristors have been the most promising candidates for the creation of modern universal memory. The possibility of light stimulated resistive switching (RS) is promising for creating optical computers, technical vision and neuron networks. The studied SixGeyOz solid alloys films (~50-65 nm) were obtained by simultaneous evaporation of GeO2 and SiO2 (or SiO) powders in high vacuum (10-8 Torr) and deposition onto n+-type, p+-type Si(001), and on Al/SiO2/Si(001) heated up to 100°C. The transparent indium tin oxide (ITO) contacts were used as top electrode. It was found, that as-deposited GeOx[SiO](1-x) films contain amorphous Ge (a-Ge) nanoclusters. The furnace annealing at temperature 500 oC lead to further forming of a-Ge clusters in both types of the films. Reversible (up to several thousand cycles) RS from high resistance state (HRS) to low resistance state (LRS) (memristor effect) were observed for the semiconductor-dielectric-metal structures, namely p+-Si (or n+-Si)/GeO[SiO2] (or GeO[SiO])/ITO structures (MIS structures) in air atmosphere. Both negative and positive photoconductivity was observed in the annealed MIS structure when both negative/positive voltage biases were applied to the top ITO electrode. This is possibly due to light-stimulated recharging of holes from a-Ge nanoclusters, which act as deep traps. The effects of light-induced RS was observed for annealed MIS structures based on GeO[SiO] films with a-Ge nanoclusters. These results are promising for creation of photomemristors and optoelectronic devices combining the properties of a memristor.

KW - Germanium nanoclusters

KW - Memristors

KW - Negative photoconductivity

KW - Nonstoichiometric germanium silicate glass

KW - Photomemristors

UR - http://www.scopus.com/inward/record.url?scp=85125669055&partnerID=8YFLogxK

UR - https://www.mendeley.com/catalogue/3fe00e1b-3145-3791-91b4-4fa85c2c3517/

U2 - 10.1117/12.2622642

DO - 10.1117/12.2622642

M3 - Conference contribution

AN - SCOPUS:85125669055

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - International Conference on Micro- and Nano-Electronics 2021

A2 - Lukichev, Vladimir F.

A2 - Rudenko, Konstantin V.

PB - SPIE

T2 - 14th International Conference on Micro- and Nano-Electronics 2021, ICMNE 2021

Y2 - 4 October 2021 through 8 October 2021

ER -

ID: 35611312