Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
In situ Ellipsometric Control of Growth Processes of ZnTe and CdTe Buffer Layers in Technology of Molecular Beam Epitaxy of Mercury Cadmium Telluride. / Shvets, V. A.; Marin, D. V.; Yakushev, M. V. и др.
в: Semiconductors, Том 58, № 1, 01.2024, стр. 67-72.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - In situ Ellipsometric Control of Growth Processes of ZnTe and CdTe Buffer Layers in Technology of Molecular Beam Epitaxy of Mercury Cadmium Telluride
AU - Shvets, V. A.
AU - Marin, D. V.
AU - Yakushev, M. V.
AU - Rykhlitskii, S. V.
N1 - This study was financially supported by a grant from the Ministry of Science and Higher Education of the Russian Federation no. 075-15-2020-797.
PY - 2024/1
Y1 - 2024/1
N2 - The problems of in situ ellipsometric control during the growth of ZnTe and CdTe buffer layers intended for cadmium-mercury-tellurium epitaxy are considered. It has been established that for 20 nm ZnTe layers the spectral dependences of the optical constants near the absorption edge are smoothed, which indicates the presence of structural defects in the film. It has been shown that the microrelief of the CdTe growth surface is a criterion for the structural perfection of the layers and can be measured using an ellipsometer both at the early stages and during steady-state growth.
AB - The problems of in situ ellipsometric control during the growth of ZnTe and CdTe buffer layers intended for cadmium-mercury-tellurium epitaxy are considered. It has been established that for 20 nm ZnTe layers the spectral dependences of the optical constants near the absorption edge are smoothed, which indicates the presence of structural defects in the film. It has been shown that the microrelief of the CdTe growth surface is a criterion for the structural perfection of the layers and can be measured using an ellipsometer both at the early stages and during steady-state growth.
KW - CdTe
KW - growth defects
KW - in situ ellipsometric control
KW - microrelief
KW - molecular beam epitaxy
UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85202757554&origin=inward&txGid=d16da0c9540f15350042ed19b827d8f7
UR - https://www.webofscience.com/wos/woscc/full-record/WOS:001303627800002
UR - https://www.mendeley.com/catalogue/d7e56bfe-e7e6-333f-a193-847606e2fef8/
U2 - 10.1134/S1063782624010147
DO - 10.1134/S1063782624010147
M3 - Article
VL - 58
SP - 67
EP - 72
JO - Semiconductors
JF - Semiconductors
SN - 1063-7826
IS - 1
ER -
ID: 61182935