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Gas Dynamic Aspects of Silicon Thin Layers Deposition Using Excitation of Free Jet of Working Gas Mixture by Electron Beam : 28th International Symposium on Rarefied Gas Dynamics. July 09-13, 2012. Zaragoza, Spain. rgd28.es/Book_of_Abstracts.pdf. / Сковородко, Петр Алексеевич; Шарафутдинов , Р.Г.; Щукин, В.Г. и др.

2012. 193.

Результаты исследований: Материалы конференцийматериалыРецензирование

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@conference{8d295ccdf61948b79f5cf113a151d72a,
title = "Gas Dynamic Aspects of Silicon Thin Layers Deposition Using Excitation of Free Jet of Working Gas Mixture by Electron Beam: 28th International Symposium on Rarefied Gas Dynamics. July 09-13, 2012. Zaragoza, Spain. rgd28.es/Book_of_Abstracts.pdf.",
author = "Сковородко, {Петр Алексеевич} and Р.Г. Шарафутдинов and В.Г. Щукин and В.О. Константинов",
year = "2012",
language = "English",
pages = "193",

}

RIS

TY - CONF

T1 - Gas Dynamic Aspects of Silicon Thin Layers Deposition Using Excitation of Free Jet of Working Gas Mixture by Electron Beam

T2 - 28th International Symposium on Rarefied Gas Dynamics. July 09-13, 2012. Zaragoza, Spain. rgd28.es/Book_of_Abstracts.pdf.

AU - Сковородко, Петр Алексеевич

AU - Шарафутдинов , Р.Г.

AU - Щукин, В.Г.

AU - Константинов , В.О.

PY - 2012

Y1 - 2012

M3 - Paper

SP - 193

ER -

ID: 27282991