Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
Electroluminescence of thin film p-i-n diodes based on a-SiC:H with integrated Ge nanoparticles. / Remes, Zdenek; Stuchlik, Jiri; Stuchlikova, The-ha и др.
в: EPJ Applied Physics, Том 88, № 3, 19025, 01.12.2019.Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование
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TY - JOUR
T1 - Electroluminescence of thin film p-i-n diodes based on a-SiC:H with integrated Ge nanoparticles
AU - Remes, Zdenek
AU - Stuchlik, Jiri
AU - Stuchlikova, The-ha
AU - Kupcik, Jaroslav
AU - Mortet, Vincent
AU - Taylor, Andrew
AU - Ashcheulov, Petr
AU - Volodin, Vladimir Alekseevich
N1 - Publisher Copyright: © EDP Sciences, 2020. Copyright: Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2019/12/1
Y1 - 2019/12/1
N2 - Hydrogenated amorphous substoichiometric silicon carbon alloys (a-SiC:H) with and without embedded Ge nanoparticles (NPs) have been prepared by plasma enhanced chemical vapour deposition combined with in-situ Ge evaporation and annealing on semi-transparent boron doped nano-crystalline diamond coated Ti grids. The presence of Ge NPs embedded in the amorphous phase has been confirmed by transmission electron microscopy and energy-dispersive X-ray spectroscopy analyses. Current-voltage (I-V) characteristics and near infrared electroluminescence (EL) spectra were measured to compare performance of diodes. The relatively strong EL appears in diodes with integrated Ge NPs near the direct band-gap transition of Ge at about 0.82 eV with an intensity strongly correlating with current density. However, it has also been found that Ge NPs integrated into a-SiC:H significantly deteriorates diode I-V characteristic.
AB - Hydrogenated amorphous substoichiometric silicon carbon alloys (a-SiC:H) with and without embedded Ge nanoparticles (NPs) have been prepared by plasma enhanced chemical vapour deposition combined with in-situ Ge evaporation and annealing on semi-transparent boron doped nano-crystalline diamond coated Ti grids. The presence of Ge NPs embedded in the amorphous phase has been confirmed by transmission electron microscopy and energy-dispersive X-ray spectroscopy analyses. Current-voltage (I-V) characteristics and near infrared electroluminescence (EL) spectra were measured to compare performance of diodes. The relatively strong EL appears in diodes with integrated Ge NPs near the direct band-gap transition of Ge at about 0.82 eV with an intensity strongly correlating with current density. However, it has also been found that Ge NPs integrated into a-SiC:H significantly deteriorates diode I-V characteristic.
KW - HYDROGENATED SILICON
UR - http://www.scopus.com/inward/record.url?scp=85091898722&partnerID=8YFLogxK
U2 - 10.1051/epjap/2020190253
DO - 10.1051/epjap/2020190253
M3 - Article
VL - 88
JO - EPJ Applied Physics
JF - EPJ Applied Physics
SN - 1286-0042
IS - 3
M1 - 19025
ER -
ID: 23787246