The atomic and electronic structure of Hf0.5Zr0.5O2 and Hf0.5Zr0.5O2: La films

Original language	English
Pages (from-to)	595-600
Number of pages	6
Journal	Journal of science-Advanced materials and devices
Volume	6
Issue number	4
DOIs	https://doi.org/10.1016/j.jsamd.2021.08.001
Publication status	Published - Dec 2021

FeRAM, XPS, Oxygen vacancy, Electronic structure, HfZrO, THIN-FILMS, OXYGEN VACANCIES, OXIDE

ID: 34678497