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Terahertz photoresistivity of a high-mobility 3D topological insulator based on a strained HgTe film

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DOI

https://doi.org/10.1063/5.0025745
Final published version

M. L. Savchenko
M. Otteneder
I. A. Dmitriev
N. N. Mikhailov
Z. D. Kvon
S. D. Ganichev

Original language	English
Article number	201103
Journal	Applied Physics Letters
Volume	117
Issue number	20
DOIs	https://doi.org/10.1063/5.0025745
Publication status	Published - 16 Nov 2020

OECD FOS+WOS

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