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Study of the optical methods of formation of multilevel profile in the thin films of a hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. / Mironnikov, N. G.; Korolkov, V. P.; Derevyanko, D. I. et al.

In: Optoelectronics, Instrumentation and Data Processing, Vol. 53, No. 5, 01.09.2017, p. 466-473.

Research output: Contribution to journal › Article › peer-review

Harvard

Mironnikov, NG, Korolkov, VP, Derevyanko, DI & Shelkovnikov, VV 2017, 'Study of the optical methods of formation of multilevel profile in the thin films of a hybrid photopolymer material based on thiol-siloxane and acrylate oligomers', Optoelectronics, Instrumentation and Data Processing, vol. 53, no. 5, pp. 466-473. https://doi.org/10.3103/S8756699017050065

APA

Mironnikov, N. G., Korolkov, V. P., Derevyanko, D. I., & Shelkovnikov, V. V. (2017). Study of the optical methods of formation of multilevel profile in the thin films of a hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. Optoelectronics, Instrumentation and Data Processing, 53(5), 466-473. https://doi.org/10.3103/S8756699017050065

Vancouver

Mironnikov NG, Korolkov VP, Derevyanko DI, Shelkovnikov VV. Study of the optical methods of formation of multilevel profile in the thin films of a hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. Optoelectronics, Instrumentation and Data Processing. 2017 Sept 1;53(5):466-473. doi: 10.3103/S8756699017050065

Author

Mironnikov, N. G. ; Korolkov, V. P. ; Derevyanko, D. I. et al. / Study of the optical methods of formation of multilevel profile in the thin films of a hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. In: Optoelectronics, Instrumentation and Data Processing. 2017 ; Vol. 53, No. 5. pp. 466-473.

BibTeX

@article{7dc19fe42bdc4f8ab159ddbaba356b76,
title = "Study of the optical methods of formation of multilevel profile in the thin films of a hybrid photopolymer material based on thiol-siloxane and acrylate oligomers",
abstract = "This paper describes a study of the optical methods for fabrication of multilevel profile in the layers of a Hybrimer-TATS hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. Grayscale photolithography and direct laser writing are used to form multilevel structures 3.5 and 6 μ in height, respectively. The characteristic curves and photosensitivity of the material are determined. The film preparation and treatment processes are optimized, and it is determined that addition of the stages of pre- and post-exposure significantly affects the photosensitive properties of Hybrimer-TATS. The photopolymer is promising as a structural material for the formation of microstructured optical components.",
keywords = "characteristic curve, hybrid photopolymer, laser writing, multilevel diffractive structures, photolithography, thiol-siloxane-acrylate oligomers, ELEMENTS, FABRICATION",
author = "Mironnikov, {N. G.} and Korolkov, {V. P.} and Derevyanko, {D. I.} and Shelkovnikov, {V. V.}",
year = "2017",
month = sep,
day = "1",
doi = "10.3103/S8756699017050065",
language = "English",
volume = "53",
pages = "466--473",
journal = "Optoelectronics, Instrumentation and Data Processing",
issn = "8756-6990",
publisher = "Allerton Press Inc.",
number = "5",

}

RIS

TY - JOUR

T1 - Study of the optical methods of formation of multilevel profile in the thin films of a hybrid photopolymer material based on thiol-siloxane and acrylate oligomers

AU - Mironnikov, N. G.

AU - Korolkov, V. P.

AU - Derevyanko, D. I.

AU - Shelkovnikov, V. V.

PY - 2017/9/1

Y1 - 2017/9/1

N2 - This paper describes a study of the optical methods for fabrication of multilevel profile in the layers of a Hybrimer-TATS hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. Grayscale photolithography and direct laser writing are used to form multilevel structures 3.5 and 6 μ in height, respectively. The characteristic curves and photosensitivity of the material are determined. The film preparation and treatment processes are optimized, and it is determined that addition of the stages of pre- and post-exposure significantly affects the photosensitive properties of Hybrimer-TATS. The photopolymer is promising as a structural material for the formation of microstructured optical components.

AB - This paper describes a study of the optical methods for fabrication of multilevel profile in the layers of a Hybrimer-TATS hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. Grayscale photolithography and direct laser writing are used to form multilevel structures 3.5 and 6 μ in height, respectively. The characteristic curves and photosensitivity of the material are determined. The film preparation and treatment processes are optimized, and it is determined that addition of the stages of pre- and post-exposure significantly affects the photosensitive properties of Hybrimer-TATS. The photopolymer is promising as a structural material for the formation of microstructured optical components.

KW - characteristic curve

KW - hybrid photopolymer

KW - laser writing

KW - multilevel diffractive structures

KW - photolithography

KW - thiol-siloxane-acrylate oligomers

KW - ELEMENTS

KW - FABRICATION

UR - http://www.scopus.com/inward/record.url?scp=85038122825&partnerID=8YFLogxK

U2 - 10.3103/S8756699017050065

DO - 10.3103/S8756699017050065

M3 - Article

AN - SCOPUS:85038122825

VL - 53

SP - 466

EP - 473

JO - Optoelectronics, Instrumentation and Data Processing

JF - Optoelectronics, Instrumentation and Data Processing

SN - 8756-6990

IS - 5

ER -

ID: 9645538