Research output: Contribution to journal › Article › peer-review
Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films. / Fainer, N. I.; Plekhanov, A. G.; Golubenko, A. N. et al.
In: Journal of Structural Chemistry, Vol. 58, No. 1, 01.01.2017, p. 119-125.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films
AU - Fainer, N. I.
AU - Plekhanov, A. G.
AU - Golubenko, A. N.
AU - Rumyantsev, Yu M.
AU - Maksimovskii, E. A.
AU - Shayapov, V. R.
PY - 2017/1/1
Y1 - 2017/1/1
N2 - Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH3)2)2NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O2+xN2), a method is developed to obtain SiCxNyOz:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The in situ composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.
AB - Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH3)2)2NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O2+xN2), a method is developed to obtain SiCxNyOz:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The in situ composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.
KW - 1,1,3,3-tetramethyldisilazane
KW - nanocomposite films
KW - plasma enhanced chemical vapor deposition
KW - silicon oxycarbonitride
UR - http://www.scopus.com/inward/record.url?scp=85016007349&partnerID=8YFLogxK
U2 - 10.1134/S0022476617010188
DO - 10.1134/S0022476617010188
M3 - Article
AN - SCOPUS:85016007349
VL - 58
SP - 119
EP - 125
JO - Journal of Structural Chemistry
JF - Journal of Structural Chemistry
SN - 0022-4766
IS - 1
ER -
ID: 10522373