Standard

Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films. / Fainer, N. I.; Plekhanov, A. G.; Golubenko, A. N. и др.

в: Journal of Structural Chemistry, Том 58, № 1, 01.01.2017, стр. 119-125.

Результаты исследований: Научные публикации в периодических изданиях › статья › Рецензирование

Harvard

Fainer, NI, Plekhanov, AG, Golubenko, AN, Rumyantsev, YM, Maksimovskii, EA & Shayapov, VR 2017, 'Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films', Journal of Structural Chemistry, Том. 58, № 1, стр. 119-125. https://doi.org/10.1134/S0022476617010188

APA

Fainer, N. I., Plekhanov, A. G., Golubenko, A. N., Rumyantsev, Y. M., Maksimovskii, E. A., & Shayapov, V. R. (2017). Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films. Journal of Structural Chemistry, 58(1), 119-125. https://doi.org/10.1134/S0022476617010188

Vancouver

Fainer NI, Plekhanov AG, Golubenko AN, Rumyantsev YM, Maksimovskii EA, Shayapov VR. Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films. Journal of Structural Chemistry. 2017 янв. 1;58(1):119-125. doi: 10.1134/S0022476617010188

Author

Fainer, N. I. ; Plekhanov, A. G. ; Golubenko, A. N. и др. / Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films. в: Journal of Structural Chemistry. 2017 ; Том 58, № 1. стр. 119-125.

BibTeX

@article{7e0c3eca82d2401a93d1bdc704d7f445,
title = "Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films",
abstract = "Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH3)2)2NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O2+xN2), a method is developed to obtain SiCxNyOz:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The in situ composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.",
keywords = "1,1,3,3-tetramethyldisilazane, nanocomposite films, plasma enhanced chemical vapor deposition, silicon oxycarbonitride",
author = "Fainer, {N. I.} and Plekhanov, {A. G.} and Golubenko, {A. N.} and Rumyantsev, {Yu M.} and Maksimovskii, {E. A.} and Shayapov, {V. R.}",
year = "2017",
month = jan,
day = "1",
doi = "10.1134/S0022476617010188",
language = "English",
volume = "58",
pages = "119--125",
journal = "Journal of Structural Chemistry",
issn = "0022-4766",
publisher = "Springer GmbH & Co, Auslieferungs-Gesellschaf",
number = "1",

}

RIS

TY - JOUR

T1 - Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films

AU - Fainer, N. I.

AU - Plekhanov, A. G.

AU - Golubenko, A. N.

AU - Rumyantsev, Yu M.

AU - Maksimovskii, E. A.

AU - Shayapov, V. R.

PY - 2017/1/1

Y1 - 2017/1/1

N2 - Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH3)2)2NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O2+xN2), a method is developed to obtain SiCxNyOz:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The in situ composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.

AB - Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH3)2)2NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O2+xN2), a method is developed to obtain SiCxNyOz:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The in situ composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.

KW - 1,1,3,3-tetramethyldisilazane

KW - nanocomposite films

KW - plasma enhanced chemical vapor deposition

KW - silicon oxycarbonitride

UR - http://www.scopus.com/inward/record.url?scp=85016007349&partnerID=8YFLogxK

U2 - 10.1134/S0022476617010188

DO - 10.1134/S0022476617010188

M3 - Article

AN - SCOPUS:85016007349

VL - 58

SP - 119

EP - 125

JO - Journal of Structural Chemistry

JF - Journal of Structural Chemistry

SN - 0022-4766

IS - 1

ER -

ID: 10522373