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Real-time observation of self-interstitial reactions on an atomically smooth silicon surface

Research output: Contribution to journal › Article › peer-review

Semiconductor Physics Section

DOI

https://doi.org/10.1016/j.susc.2019.04.008
Final published version

S. Kosolobov
G. Nazarikov
S. Sitnikov
I. Pshenichnyuk
L. Fedina
A. Latyshev

Original language	English
Pages (from-to)	25-33
Number of pages	9
Journal	Surface Science
Volume	687
DOIs	https://doi.org/10.1016/j.susc.2019.04.008
Publication status	Published - 1 Sept 2019

Research areas

REFLECTION ELECTRON-MICROSCOPY, STEP PERMEABILITY, DOPANT DIFFUSION, SI(111) SURFACE, 2-DIMENSIONAL ISLANDS, IN-SITU, GOLD, NUCLEATION, GROWTH, SUBLIMATION

OECD FOS+WOS

ID: 20045640