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Optical gain and stimulated emission in optically pumped heavily doped Al0.74Ga0.26N:Si structures with external cavity. / Bokhan, P. A.; Fateev, N. V.; Malin, T. V. et al.
In: Optical Materials, Vol. 105, 109879, 07.2020.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Optical gain and stimulated emission in optically pumped heavily doped Al0.74Ga0.26N:Si structures with external cavity
AU - Bokhan, P. A.
AU - Fateev, N. V.
AU - Malin, T. V.
AU - Osinnykh, I. V.
AU - Zakrevsky, Dm E.
AU - Zhuravlev, K. S.
PY - 2020/7
Y1 - 2020/7
N2 - The pulse lasing in the broadband spectral range 420–590 nm was obtained from two squeezed together heavily Si doped Al0.74Ga0.26N/AlN/Al2O3 structures with external cavity under pump radiation with λp = 266 nm wavelength. These structures were grown by molecular beam epitaxy on (0001) oriented thick sapphire substrates. Stimulated emission at room temperature was observed with optical pumping thresholds 50 kW/cm2 in the semiconfocal cavity. The linear transverse-electric polarization dominates in the output emission. The optical gain coefficients values of (0.12–6) × 103 cm−1 for Al0.74Ga0.26N:Si films with inhomogeneous luminescence broadening were measured at 10–600 kW/cm2 pump power density radiation with 266 nm wavelength, 8 ns pulse duration and 10 Hz repetition rate.
AB - The pulse lasing in the broadband spectral range 420–590 nm was obtained from two squeezed together heavily Si doped Al0.74Ga0.26N/AlN/Al2O3 structures with external cavity under pump radiation with λp = 266 nm wavelength. These structures were grown by molecular beam epitaxy on (0001) oriented thick sapphire substrates. Stimulated emission at room temperature was observed with optical pumping thresholds 50 kW/cm2 in the semiconfocal cavity. The linear transverse-electric polarization dominates in the output emission. The optical gain coefficients values of (0.12–6) × 103 cm−1 for Al0.74Ga0.26N:Si films with inhomogeneous luminescence broadening were measured at 10–600 kW/cm2 pump power density radiation with 266 nm wavelength, 8 ns pulse duration and 10 Hz repetition rate.
KW - Donor-acceptor pair transitions
KW - Doped AlGaN film
KW - External cavity
KW - Lasing threshold
KW - Optical gain
KW - Stimulated emission
KW - LUMINESCENCE
UR - http://www.scopus.com/inward/record.url?scp=85082745241&partnerID=8YFLogxK
U2 - 10.1016/j.optmat.2020.109879
DO - 10.1016/j.optmat.2020.109879
M3 - Article
AN - SCOPUS:85082745241
VL - 105
JO - Optical Materials
JF - Optical Materials
SN - 0925-3467
M1 - 109879
ER -
ID: 23949617