Research output: Contribution to journal › Article › peer-review
New graphene derivative with: N -methylpyrrolidone: Suspension, structural, optical and electrical properties. / Yakimchuk, Evgenyi; Volodin, Vladimir; Antonova, Irina.
In: Physical Chemistry Chemical Physics, Vol. 21, No. 23, 21.06.2019, p. 12494-12504.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - New graphene derivative with: N -methylpyrrolidone: Suspension, structural, optical and electrical properties
AU - Yakimchuk, Evgenyi
AU - Volodin, Vladimir
AU - Antonova, Irina
PY - 2019/6/21
Y1 - 2019/6/21
N2 - In the present study, a new graphene derivative created by the interaction of 2-5 nm thick multi-graphene suspension flakes with N-methylpyrrolidone (NMP) was examined. It was found that the conductivity of the films prepared from the suspensions obtained using the treatment of initial graphene suspensions in NMP decreased after additional annealing in the temperature range from 60 to 200 °C by six to seven orders of magnitude. The annealing temperature required for this decrease of conductivity shows a decrease with diminishing suspension flake sizes. The obtained high-resistivity films demonstrate low leakage currents (10-7-10-8 A cm-2), an ultra-low charge in the functionalized films (-(1-4) × 1010 cm-2), a relatively high dielectric constant of 7.0-9.0, and a breakdown electric-field strength of (2-3) × 105 V cm-1. The possibility to restore the conductivity to a resistance value of 43 kΩ sq-1 in the upper layer of the films prepared from the functionalized suspension and the possibility to obtain an unexpectedly high value of electron mobility μ ≈ 55-65 cm2 V-1 s-1 in the recovered few top layers (in comparison with the electron mobility of 0.1-1 cm2 V-1 s-1 in the films prepared from the initial suspension) was shown. The combination of the useful properties of the films prepared from the functionalized graphene suspension together with the possibility to form heterostructures using the simple chemical recovery of the top layer and the expected flexibility of such heterostructures, makes these films promising for a wide range of applications, including the fabrication of dielectric films for van der Waals heterostructures and structures intended for flexible and printed electronics.
AB - In the present study, a new graphene derivative created by the interaction of 2-5 nm thick multi-graphene suspension flakes with N-methylpyrrolidone (NMP) was examined. It was found that the conductivity of the films prepared from the suspensions obtained using the treatment of initial graphene suspensions in NMP decreased after additional annealing in the temperature range from 60 to 200 °C by six to seven orders of magnitude. The annealing temperature required for this decrease of conductivity shows a decrease with diminishing suspension flake sizes. The obtained high-resistivity films demonstrate low leakage currents (10-7-10-8 A cm-2), an ultra-low charge in the functionalized films (-(1-4) × 1010 cm-2), a relatively high dielectric constant of 7.0-9.0, and a breakdown electric-field strength of (2-3) × 105 V cm-1. The possibility to restore the conductivity to a resistance value of 43 kΩ sq-1 in the upper layer of the films prepared from the functionalized suspension and the possibility to obtain an unexpectedly high value of electron mobility μ ≈ 55-65 cm2 V-1 s-1 in the recovered few top layers (in comparison with the electron mobility of 0.1-1 cm2 V-1 s-1 in the films prepared from the initial suspension) was shown. The combination of the useful properties of the films prepared from the functionalized graphene suspension together with the possibility to form heterostructures using the simple chemical recovery of the top layer and the expected flexibility of such heterostructures, makes these films promising for a wide range of applications, including the fabrication of dielectric films for van der Waals heterostructures and structures intended for flexible and printed electronics.
KW - FEW-LAYER GRAPHENE
KW - SURFACE
KW - FUNCTIONALIZATION
KW - HETEROSTRUCTURES
KW - EXFOLIATION
KW - TRANSISTORS
KW - GROWTH
UR - http://www.scopus.com/inward/record.url?scp=85067275062&partnerID=8YFLogxK
U2 - 10.1039/c9cp01612k
DO - 10.1039/c9cp01612k
M3 - Article
C2 - 31144691
AN - SCOPUS:85067275062
VL - 21
SP - 12494
EP - 12504
JO - Physical Chemistry Chemical Physics
JF - Physical Chemistry Chemical Physics
SN - 1463-9076
IS - 23
ER -
ID: 20587312