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Microstructure and dispersive optical parameters of iron films deposited by the thermal evaporation method. / Atuchin, V. V.; Kochubey, V. A.; Kozhukhov, A. S. et al.

In: Optik, Vol. 188, 01.07.2019, p. 120-125.

Research output: Contribution to journal › Article › peer-review

Harvard

Atuchin, VV, Kochubey, VA, Kozhukhov, AS, Kruchinin, VN, Pokrovsky, LD, Soldatenkov, IS & Troitskaia, IB 2019, 'Microstructure and dispersive optical parameters of iron films deposited by the thermal evaporation method', Optik, vol. 188, pp. 120-125. https://doi.org/10.1016/j.ijleo.2019.04.122

APA

Atuchin, V. V., Kochubey, V. A., Kozhukhov, A. S., Kruchinin, V. N., Pokrovsky, L. D., Soldatenkov, I. S., & Troitskaia, I. B. (2019). Microstructure and dispersive optical parameters of iron films deposited by the thermal evaporation method. Optik, 188, 120-125. https://doi.org/10.1016/j.ijleo.2019.04.122

Vancouver

Atuchin VV, Kochubey VA, Kozhukhov AS, Kruchinin VN, Pokrovsky LD, Soldatenkov IS et al. Microstructure and dispersive optical parameters of iron films deposited by the thermal evaporation method. Optik. 2019 Jul 1;188:120-125. doi: 10.1016/j.ijleo.2019.04.122

Author

Atuchin, V. V. ; Kochubey, V. A. ; Kozhukhov, A. S. et al. / Microstructure and dispersive optical parameters of iron films deposited by the thermal evaporation method. In: Optik. 2019 ; Vol. 188. pp. 120-125.

BibTeX

@article{af788a6fac794b9fa39644c629b78019,
title = "Microstructure and dispersive optical parameters of iron films deposited by the thermal evaporation method",
abstract = "In the present study, the structure, microrelief and optical properties of the iron films deposited onto silica and silicon substrates by thermal evaporation have been evaluated. The film top surface layer is a textured iron polycrystal, as it has been verified by RHEED. When iron is deposited onto silicon, the microrelief magnitude is below 12–15 nm, as measured by AFM. The dispersive optical constants n(λ) and k(λ) of the iron films have been defined over the spectral range of λ = 250–1100 nm by spectroscopic ellipsometry. The n(λ) and k(λ) parameters open a possibility of precise thin semi-transparent iron film thickness measurement by laser ellipsometry.",
keywords = "Iron film, Microrelief, Spectroscopic ellipsometry, Structure, Thermal evaporation, THIN-FILMS, CONSTANTS, THICKNESS DEPENDENCE, GROWTH, SURFACE, MAGNETIC-PROPERTIES, NI, ABSORPTION, ELECTRONIC-STRUCTURE, FE",
author = "Atuchin, {V. V.} and Kochubey, {V. A.} and Kozhukhov, {A. S.} and Kruchinin, {V. N.} and Pokrovsky, {L. D.} and Soldatenkov, {I. S.} and Troitskaia, {I. B.}",
year = "2019",
month = jul,
day = "1",
doi = "10.1016/j.ijleo.2019.04.122",
language = "English",
volume = "188",
pages = "120--125",
journal = "Optik",
issn = "0030-4026",
publisher = "Urban und Fischer Verlag Jena",

}

RIS

TY - JOUR

T1 - Microstructure and dispersive optical parameters of iron films deposited by the thermal evaporation method

AU - Atuchin, V. V.

AU - Kochubey, V. A.

AU - Kozhukhov, A. S.

AU - Kruchinin, V. N.

AU - Pokrovsky, L. D.

AU - Soldatenkov, I. S.

AU - Troitskaia, I. B.

PY - 2019/7/1

Y1 - 2019/7/1

N2 - In the present study, the structure, microrelief and optical properties of the iron films deposited onto silica and silicon substrates by thermal evaporation have been evaluated. The film top surface layer is a textured iron polycrystal, as it has been verified by RHEED. When iron is deposited onto silicon, the microrelief magnitude is below 12–15 nm, as measured by AFM. The dispersive optical constants n(λ) and k(λ) of the iron films have been defined over the spectral range of λ = 250–1100 nm by spectroscopic ellipsometry. The n(λ) and k(λ) parameters open a possibility of precise thin semi-transparent iron film thickness measurement by laser ellipsometry.

AB - In the present study, the structure, microrelief and optical properties of the iron films deposited onto silica and silicon substrates by thermal evaporation have been evaluated. The film top surface layer is a textured iron polycrystal, as it has been verified by RHEED. When iron is deposited onto silicon, the microrelief magnitude is below 12–15 nm, as measured by AFM. The dispersive optical constants n(λ) and k(λ) of the iron films have been defined over the spectral range of λ = 250–1100 nm by spectroscopic ellipsometry. The n(λ) and k(λ) parameters open a possibility of precise thin semi-transparent iron film thickness measurement by laser ellipsometry.

KW - Iron film

KW - Microrelief

KW - Spectroscopic ellipsometry

KW - Structure

KW - Thermal evaporation

KW - THIN-FILMS

KW - CONSTANTS

KW - THICKNESS DEPENDENCE

KW - GROWTH

KW - SURFACE

KW - MAGNETIC-PROPERTIES

KW - NI

KW - ABSORPTION

KW - ELECTRONIC-STRUCTURE

KW - FE

UR - http://www.scopus.com/inward/record.url?scp=85065842665&partnerID=8YFLogxK

U2 - 10.1016/j.ijleo.2019.04.122

DO - 10.1016/j.ijleo.2019.04.122

M3 - Article

AN - SCOPUS:85065842665

VL - 188

SP - 120

EP - 125

JO - Optik

JF - Optik

SN - 0030-4026

ER -

ID: 20040233