In situ reflection electron microscopy for the surface processes analysis during sublimation and epitaxial growth of layered metal chalcogenides › Research Explorer

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In situ reflection electron microscopy for the surface processes analysis during sublimation and epitaxial growth of layered metal chalcogenides

Research output: Contribution to journal › Article › peer-review

DOI

https://doi.org/10.3897/j.moem.10.4.144317
Final published version

Sergei A. Ponomarev
Dmitry I. Rogilo
Konstantin E. Zakhozhev
Dmitry A. Nasimov
Nina N. Kurus
Anton K. Gutakovskii
Konstantin A. Kokh
Alexander G. Milekhin
Dmitry V. Sheglov
Alexander V. Latyshev

Original language	English
Pages (from-to)	251-261
Number of pages	11
Journal	Modern Electronic Materials
Volume	10
Issue number	4
DOIs	https://doi.org/10.3897/j.moem.10.4.144317
Publication status	Published - 2024

OECD FOS+WOS

2.02 ELECTRICAL ENG, ELECTRONIC ENG
2.10 NANO-TECHNOLOGY
2.05 MATERIALS ENGINEERING

ID: 64903984