Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Research › peer-review
Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source. / Kaygorodtsev, Vyacheslav A.; Krasnov, Alexander A.
International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM. IEEE Computer Society, 2024. p. 940-943 (International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Research › peer-review
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TY - GEN
T1 - Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source
AU - Kaygorodtsev, Vyacheslav A.
AU - Krasnov, Alexander A.
N1 - Conference code: 25
PY - 2024
Y1 - 2024
N2 - The magnetron sputtering is used for obtaining getter films for synchrotron radiation source Siberian Circular Photon Source. Getter thin films are to be used inside straight sections of the storage ring. The main problem of this technique is overheating cathode. Storage ring has narrow aperture where heat removal would be difficult. Decreasing the cathode power leads to nonuniform getter thin film thickness, since it is highly dependent on cathode current density. One way to reduce temperature without sacrificing in uniformity of film thickness is to apply pulsed method. The idea behind the pulsed mode is to generate pulses, during which the pulse-width modulation signal is sent to the field-effect transistor gate and the current through gas-discharge cell is generated. The current is integrated using an inductance. The controller unit as well as PC application which implement this method were designed. First experiments show increased thickness uniformity of getter films compared to non-pulsed sputtering.
AB - The magnetron sputtering is used for obtaining getter films for synchrotron radiation source Siberian Circular Photon Source. Getter thin films are to be used inside straight sections of the storage ring. The main problem of this technique is overheating cathode. Storage ring has narrow aperture where heat removal would be difficult. Decreasing the cathode power leads to nonuniform getter thin film thickness, since it is highly dependent on cathode current density. One way to reduce temperature without sacrificing in uniformity of film thickness is to apply pulsed method. The idea behind the pulsed mode is to generate pulses, during which the pulse-width modulation signal is sent to the field-effect transistor gate and the current through gas-discharge cell is generated. The current is integrated using an inductance. The controller unit as well as PC application which implement this method were designed. First experiments show increased thickness uniformity of getter films compared to non-pulsed sputtering.
KW - SKIF
KW - magnetron sputtering
KW - pulsed sputtering
KW - synchrotron radiation
KW - thin films
KW - vacuum chambers
UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85201973997&origin=inward&txGid=0f79c4fd1205a2f3b423bc8317053101
UR - https://www.mendeley.com/catalogue/f5d89776-8d50-316a-8c83-eb7826f77557/
U2 - 10.1109/EDM61683.2024.10614971
DO - 10.1109/EDM61683.2024.10614971
M3 - Conference contribution
SN - 9798350389234
T3 - International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM
SP - 940
EP - 943
BT - International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM
PB - IEEE Computer Society
T2 - 25th IEEE International Conference of Young Professionals in Electron Devices and Materials
Y2 - 28 June 2024 through 2 July 2024
ER -
ID: 60548527