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Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source. / Kaygorodtsev, Vyacheslav A.; Krasnov, Alexander A.

International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM. IEEE Computer Society, 2024. стр. 940-943 (International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM).

Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференцийстатья в сборнике материалов конференциинаучнаяРецензирование

Harvard

Kaygorodtsev, VA & Krasnov, AA 2024, Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source. в International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM. International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM, IEEE Computer Society, стр. 940-943, 25th IEEE International Conference of Young Professionals in Electron Devices and Materials, Российская Федерация, 28.06.2024. https://doi.org/10.1109/EDM61683.2024.10614971

APA

Kaygorodtsev, V. A., & Krasnov, A. A. (2024). Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source. в International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM (стр. 940-943). (International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM). IEEE Computer Society. https://doi.org/10.1109/EDM61683.2024.10614971

Vancouver

Kaygorodtsev VA, Krasnov AA. Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source. в International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM. IEEE Computer Society. 2024. стр. 940-943. (International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM). doi: 10.1109/EDM61683.2024.10614971

Author

Kaygorodtsev, Vyacheslav A. ; Krasnov, Alexander A. / Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source. International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM. IEEE Computer Society, 2024. стр. 940-943 (International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM).

BibTeX

@inproceedings{ab94c902b2374a56b4616fbdf7f130a6,
title = "Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source",
abstract = "The magnetron sputtering is used for obtaining getter films for synchrotron radiation source Siberian Circular Photon Source. Getter thin films are to be used inside straight sections of the storage ring. The main problem of this technique is overheating cathode. Storage ring has narrow aperture where heat removal would be difficult. Decreasing the cathode power leads to nonuniform getter thin film thickness, since it is highly dependent on cathode current density. One way to reduce temperature without sacrificing in uniformity of film thickness is to apply pulsed method. The idea behind the pulsed mode is to generate pulses, during which the pulse-width modulation signal is sent to the field-effect transistor gate and the current through gas-discharge cell is generated. The current is integrated using an inductance. The controller unit as well as PC application which implement this method were designed. First experiments show increased thickness uniformity of getter films compared to non-pulsed sputtering.",
keywords = "SKIF, magnetron sputtering, pulsed sputtering, synchrotron radiation, thin films, vacuum chambers",
author = "Kaygorodtsev, {Vyacheslav A.} and Krasnov, {Alexander A.}",
note = "This work was partially supported by the Ministry of Science and Higher Education of the Russian Federation within the governmental order for SRF SKIF Boreskov Institute of Catalysis (project FWUR-2024-0041).; 25th IEEE International Conference of Young Professionals in Electron Devices and Materials, EDM 2024 ; Conference date: 28-06-2024 Through 02-07-2024",
year = "2024",
doi = "10.1109/EDM61683.2024.10614971",
language = "English",
isbn = "9798350389234",
series = "International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM",
publisher = "IEEE Computer Society",
pages = "940--943",
booktitle = "International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM",
address = "United States",
url = "https://edm.ieeesiberia.org/",

}

RIS

TY - GEN

T1 - Getter Thin Films Pulsed Magnetron Sputtering in Narrow Aperture Vacuum Chambers of Synchrotron Radiation Source

AU - Kaygorodtsev, Vyacheslav A.

AU - Krasnov, Alexander A.

N1 - Conference code: 25

PY - 2024

Y1 - 2024

N2 - The magnetron sputtering is used for obtaining getter films for synchrotron radiation source Siberian Circular Photon Source. Getter thin films are to be used inside straight sections of the storage ring. The main problem of this technique is overheating cathode. Storage ring has narrow aperture where heat removal would be difficult. Decreasing the cathode power leads to nonuniform getter thin film thickness, since it is highly dependent on cathode current density. One way to reduce temperature without sacrificing in uniformity of film thickness is to apply pulsed method. The idea behind the pulsed mode is to generate pulses, during which the pulse-width modulation signal is sent to the field-effect transistor gate and the current through gas-discharge cell is generated. The current is integrated using an inductance. The controller unit as well as PC application which implement this method were designed. First experiments show increased thickness uniformity of getter films compared to non-pulsed sputtering.

AB - The magnetron sputtering is used for obtaining getter films for synchrotron radiation source Siberian Circular Photon Source. Getter thin films are to be used inside straight sections of the storage ring. The main problem of this technique is overheating cathode. Storage ring has narrow aperture where heat removal would be difficult. Decreasing the cathode power leads to nonuniform getter thin film thickness, since it is highly dependent on cathode current density. One way to reduce temperature without sacrificing in uniformity of film thickness is to apply pulsed method. The idea behind the pulsed mode is to generate pulses, during which the pulse-width modulation signal is sent to the field-effect transistor gate and the current through gas-discharge cell is generated. The current is integrated using an inductance. The controller unit as well as PC application which implement this method were designed. First experiments show increased thickness uniformity of getter films compared to non-pulsed sputtering.

KW - SKIF

KW - magnetron sputtering

KW - pulsed sputtering

KW - synchrotron radiation

KW - thin films

KW - vacuum chambers

UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85201973997&origin=inward&txGid=0f79c4fd1205a2f3b423bc8317053101

UR - https://www.mendeley.com/catalogue/f5d89776-8d50-316a-8c83-eb7826f77557/

U2 - 10.1109/EDM61683.2024.10614971

DO - 10.1109/EDM61683.2024.10614971

M3 - Conference contribution

SN - 9798350389234

T3 - International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM

SP - 940

EP - 943

BT - International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM

PB - IEEE Computer Society

T2 - 25th IEEE International Conference of Young Professionals in Electron Devices and Materials

Y2 - 28 June 2024 through 2 July 2024

ER -

ID: 60548527