Research output: Contribution to journal › Article › peer-review
Features of the Cluster-Ion Treatment of the Surface of a KGd(WO4)2:Nd Single Crystal. / Николаев, Иван Владимирович; Коробейщиков, Николай Геннадьевич.
In: Journal of Surface Investigation, Vol. 18, No. 2, 04.2024, p. 313-317.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Features of the Cluster-Ion Treatment of the Surface of a KGd(WO4)2:Nd Single Crystal
AU - Николаев, Иван Владимирович
AU - Коробейщиков, Николай Геннадьевич
N1 - The study was financially supported by the Russian Science Foundation (grant no. 21-19-00046) in terms of sample preparation and treatment, and the Ministry of Science and Higher Education of the Russian Federation (grant FSUS-2020-0039) in terms of sample analysis using equipment of the Center for Collective Use “Applied Physics” of Novosibirsk State University.
PY - 2024/4
Y1 - 2024/4
N2 - The features of the surface treatment of potassium-gadolinium-tungstate single crystals doped with neodymium ions by low- and high-energy argon cluster ions are considered. Two radically different treatment modes are employed: the low-energy mode for more efficient smoothing of the surface and high-energy for more effective etching of the target. The topography of the target surface is analyzed before and after cluster-ion treatment using atomic force microscopy. It is shown that treatment in the low-energy mode smoothes out irregularities on the target surface formed by chemical and mechanical polishing at an etching depth of less than 100 nm. A comparison is made of the root-mean-square roughness and total roughness of the initial and treated surfaces of potassium-gadolinium tungstate doped with neodymium ions. Survey X-ray photoelectron spectra of the initial surface of a KGd(WO4)2:Nd single crystal and after cluster-ion treatment in various modes are presented. It is demonstrated that the intensities of the potassium and gadolinium peaks decrease after cluster-ion treatment in both modes. A significant decrease in the concentration of potassium atoms in the surface layer of the target is explained by the preferential sputtering of potassium as a lighter chemical element. The mutual decrease in the concentrations of gadolinium and potassium atoms can be explained by the weak bonds of these atoms in the lattice of the KGd(WO4)2:Nd single crystal.
AB - The features of the surface treatment of potassium-gadolinium-tungstate single crystals doped with neodymium ions by low- and high-energy argon cluster ions are considered. Two radically different treatment modes are employed: the low-energy mode for more efficient smoothing of the surface and high-energy for more effective etching of the target. The topography of the target surface is analyzed before and after cluster-ion treatment using atomic force microscopy. It is shown that treatment in the low-energy mode smoothes out irregularities on the target surface formed by chemical and mechanical polishing at an etching depth of less than 100 nm. A comparison is made of the root-mean-square roughness and total roughness of the initial and treated surfaces of potassium-gadolinium tungstate doped with neodymium ions. Survey X-ray photoelectron spectra of the initial surface of a KGd(WO4)2:Nd single crystal and after cluster-ion treatment in various modes are presented. It is demonstrated that the intensities of the potassium and gadolinium peaks decrease after cluster-ion treatment in both modes. A significant decrease in the concentration of potassium atoms in the surface layer of the target is explained by the preferential sputtering of potassium as a lighter chemical element. The mutual decrease in the concentrations of gadolinium and potassium atoms can be explained by the weak bonds of these atoms in the lattice of the KGd(WO4)2:Nd single crystal.
KW - KGd(WO4)2:Nd single crystal
KW - X-ray photoelectron spectroscopy
KW - atomic force microscopy
KW - cluster-ion beam
KW - elemental composition
KW - gas cluster
KW - surface morphology
KW - surface roughness
KW - surface sputtering
UR - https://www.scopus.com/record/display.uri?eid=2-s2.0-85192264362&origin=inward&txGid=085a170d6e6fde1a15b0ab6cef4c85c8
UR - https://www.elibrary.ru/item.asp?id=67311755
UR - https://www.mendeley.com/catalogue/95e82f93-8485-3290-8e27-e1ad983ecbd8/
U2 - 10.1134/S1027451024020137
DO - 10.1134/S1027451024020137
M3 - Article
VL - 18
SP - 313
EP - 317
JO - Journal of Surface Investigation
JF - Journal of Surface Investigation
SN - 1027-4510
IS - 2
ER -
ID: 60095468