• T. V. Malin
  • D. S. Milakhin
  • V. G. Mansurov
  • Yu G. Galitsyn
  • A. S. Kozhuhov
  • V. V. Ratnikov
  • A. N. Smirnov
  • V. Yu Davydov
  • K. S. Zhuravlev
Original languageEnglish
Pages (from-to)789-796
Number of pages8
JournalSemiconductors
Volume52
Issue number6
DOIs
Publication statusPublished - 1 Jun 2018

    Research areas

  • VAPOR-PHASE EPITAXY, 0001 AL2O3, GAN, SURFACE, GROWTH, POLARITY, SUBSTRATE, FILMS, MICROSCOPY, MORPHOLOGY

    OECD FOS+WOS

ID: 13488171