Crystallization of Amorphous Germanium Films and Multilayer a-Ge/a-Si Structures upon Exposure to Nanosecond Laser Radiation › Research Explorer

DOI

https://doi.org/10.1134/S1063782619030217
Final published version

V. A. Volodin
G. K. Krivyakin
G. D. Ivlev
S. L. Prokopyev
S. V. Gusakova
A. A. Popov

Original language	English
Pages (from-to)	400-405
Number of pages	6
Journal	Semiconductors
Volume	53
Issue number	3
DOIs	https://doi.org/10.1134/S1063782619030217
Publication status	Published - 1 Mar 2019

Research areas

RAMAN-SPECTROSCOPY DATA, SILICON FILMS, HYDROGENATED SILICON, EXCIMER-LASER, NANOCRYSTALS, GLASS, PHOTOLUMINESCENCE, NANOCLUSTERS, PHASE

OECD FOS+WOS

ID: 20050137