Charge transport mechanism in La:HfO2 › Research Explorer

DOI

https://doi.org/10.1063/5.0021779
Final published version

V. A. Gritsenko
A. A. Gismatulin

Original language	English
Article number	142901
Number of pages	4
Journal	Applied Physics Letters
Volume	117
Issue number	14
DOIs	https://doi.org/10.1063/5.0021779
Publication status	Published - 5 Oct 2020

OECD FOS+WOS

Research areas

ATOMIC LAYER DEPOSITION, CONDUCTION, NITRIDE, FILMS

ID: 25687205