Atomic Structure and Optical Properties of Plasma Enhanced Chemical Vapor Deposited SiCOH Low-k Dielectric Film › Research Explorer

DOI

https://doi.org/10.1134/S0030400X21050088
Final published version

V. N. Kruchinin
V. A. Volodin
S. V. Rykhlitskii
V. A. Gritsenko
I. P. Posvirin
Xiaoping Shi
M. R. Baklanov

Original language	English
Pages (from-to)	645-651
Number of pages	7
Journal	Optics and Spectroscopy
Volume	129
Issue number	6
DOIs	https://doi.org/10.1134/S0030400X21050088
Publication status	Published - Jun 2021

Research areas

atomic structure, low-k dielectrics, optical properties, PECVD

OECD FOS+WOS

2.05 MATERIALS ENGINEERING
1.03 PHYSICAL SCIENCES AND ASTRONOMY
1.03.SY OPTICS
2.11.XQ SPECTROSCOPY

ID: 35176168