Research output: Contribution to journal › Article › peer-review
Atomic and electronic structure of oxygen polyvacancies in ZrO2. / Perevalov, T. V.; Islamov, D. R.
In: Microelectronic Engineering, Vol. 178, 25.06.2017, p. 275-278.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Atomic and electronic structure of oxygen polyvacancies in ZrO2
AU - Perevalov, T. V.
AU - Islamov, D. R.
PY - 2017/6/25
Y1 - 2017/6/25
N2 - We investigate oxygen-deficient crystalline zirconia using quantum-chemical simulation within the hybrid density functional theory. It was shown that the oxygen vacancy in ZrO2 is the amphoteric defects and it can act as the electron and hole trap. The most energetically favorable spatial configuration of oxygen polyvacancies in ZrO2 were calculated. It was found that each subsequent vacancy forms near the already existing one, and no more than 2 removed O atoms, related to Zr atom. The ability of oxygen polyvacancy to act as a conductive filament and to participate in the resistive switching is discussed.
AB - We investigate oxygen-deficient crystalline zirconia using quantum-chemical simulation within the hybrid density functional theory. It was shown that the oxygen vacancy in ZrO2 is the amphoteric defects and it can act as the electron and hole trap. The most energetically favorable spatial configuration of oxygen polyvacancies in ZrO2 were calculated. It was found that each subsequent vacancy forms near the already existing one, and no more than 2 removed O atoms, related to Zr atom. The ability of oxygen polyvacancy to act as a conductive filament and to participate in the resistive switching is discussed.
KW - Defect states
KW - Density functional theory
KW - Localization
KW - Oxygen vacancy
KW - Polyvacancy
KW - Zirconia
KW - DEFECTS
KW - ZIRCONIA
UR - http://www.scopus.com/inward/record.url?scp=85019938276&partnerID=8YFLogxK
U2 - 10.1016/j.mee.2017.05.036
DO - 10.1016/j.mee.2017.05.036
M3 - Article
AN - SCOPUS:85019938276
VL - 178
SP - 275
EP - 278
JO - Microelectronic Engineering
JF - Microelectronic Engineering
SN - 0167-9317
ER -
ID: 10187822