Aluminum-induced crystallization of silicon suboxide thin films

Original language	English
Article number	646
Number of pages	4
Journal	Applied Physics A: Materials Science and Processing
Volume	124
Issue number	9
DOIs	https://doi.org/10.1007/s00339-018-2070-y
Publication status	Published - 1 Sept 2018

AL-INDUCED CRYSTALLIZATION, VAPOR-DEPOSITION METHOD, INDUCED LAYER EXCHANGE, POLYCRYSTALLINE SILICON, SI FILMS, ORIENTATION, MORPHOLOGY, GLASS

ID: 16232895