TY - JOUR

T1 - Studying the microstructure of Pt layers prepared by chemical vapor deposition in the presence of hydrogen

AU - Dorovskikh, S. I.

AU - Klyamer, D. D.

AU - Koretskaya, T. P.

AU - Kal′nyi, D. B.

AU - Morozova, N. B.

PY - 2020/8/1

Y1 - 2020/8/1

N2 - Platinum layers with developed surface areas are prepared for the first time on the contacts of diagnostic electrodes by chemical vapor deposition using the adduct between hexafluoroacetylacetonate-trimethylplatinum(IV) and pyridine used as the precursor in an atmosphere of hydrogen. The effect of the reagent gas concentration, deposition temperature, and gas phase activation temperature on the composition and microstructure of the films is studied by EDS, powder XRD, SEM, and Raman spectroscopy methods. The conditions of depositing films with minimal impurity contents are determined, the possibility of preparing layers with a fractal-like surface structure is demonstrated. The growth rate of the sample in the presence of hydrogen is shown to reach 3.2 nm/min. The regimes for the precipitation of functional layers on electrode contacts (capacitance values of 2.2-9.2 µF/cm2) and on Ti discs are determined.

AB - Platinum layers with developed surface areas are prepared for the first time on the contacts of diagnostic electrodes by chemical vapor deposition using the adduct between hexafluoroacetylacetonate-trimethylplatinum(IV) and pyridine used as the precursor in an atmosphere of hydrogen. The effect of the reagent gas concentration, deposition temperature, and gas phase activation temperature on the composition and microstructure of the films is studied by EDS, powder XRD, SEM, and Raman spectroscopy methods. The conditions of depositing films with minimal impurity contents are determined, the possibility of preparing layers with a fractal-like surface structure is demonstrated. The growth rate of the sample in the presence of hydrogen is shown to reach 3.2 nm/min. The regimes for the precipitation of functional layers on electrode contacts (capacitance values of 2.2-9.2 µF/cm2) and on Ti discs are determined.

KW - chemical vapor deposition

KW - electrochemically active surface area

KW - film structure

KW - platinum

KW - SURFACE-AREA

KW - STIMULATION/SENSING MATERIALS

KW - PLATINUM

KW - ELECTRODES

KW - IR

KW - NEURAL STIMULATION

KW - ELECTROCHEMICAL-BEHAVIOR

KW - PRECURSORS

KW - IRIDIUM OXIDE

UR - http://www.scopus.com/inward/record.url?scp=85091266884&partnerID=8YFLogxK

U2 - 10.1134/S0022476620080053

DO - 10.1134/S0022476620080053

M3 - Article

AN - SCOPUS:85091266884

VL - 61

SP - 1211

EP - 1218

JO - Journal of Structural Chemistry

JF - Journal of Structural Chemistry

SN - 0022-4766

IS - 8

ER -