Research output: Contribution to journal › Article › peer-review
Studying the microstructure of Pt layers prepared by chemical vapor deposition in the presence of hydrogen. / Dorovskikh, S. I.; Klyamer, D. D.; Koretskaya, T. P. et al.
In: Journal of Structural Chemistry, Vol. 61, No. 8, 01.08.2020, p. 1211-1218.Research output: Contribution to journal › Article › peer-review
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TY - JOUR
T1 - Studying the microstructure of Pt layers prepared by chemical vapor deposition in the presence of hydrogen
AU - Dorovskikh, S. I.
AU - Klyamer, D. D.
AU - Koretskaya, T. P.
AU - Kal′nyi, D. B.
AU - Morozova, N. B.
PY - 2020/8/1
Y1 - 2020/8/1
N2 - Platinum layers with developed surface areas are prepared for the first time on the contacts of diagnostic electrodes by chemical vapor deposition using the adduct between hexafluoroacetylacetonate-trimethylplatinum(IV) and pyridine used as the precursor in an atmosphere of hydrogen. The effect of the reagent gas concentration, deposition temperature, and gas phase activation temperature on the composition and microstructure of the films is studied by EDS, powder XRD, SEM, and Raman spectroscopy methods. The conditions of depositing films with minimal impurity contents are determined, the possibility of preparing layers with a fractal-like surface structure is demonstrated. The growth rate of the sample in the presence of hydrogen is shown to reach 3.2 nm/min. The regimes for the precipitation of functional layers on electrode contacts (capacitance values of 2.2-9.2 µF/cm2) and on Ti discs are determined.
AB - Platinum layers with developed surface areas are prepared for the first time on the contacts of diagnostic electrodes by chemical vapor deposition using the adduct between hexafluoroacetylacetonate-trimethylplatinum(IV) and pyridine used as the precursor in an atmosphere of hydrogen. The effect of the reagent gas concentration, deposition temperature, and gas phase activation temperature on the composition and microstructure of the films is studied by EDS, powder XRD, SEM, and Raman spectroscopy methods. The conditions of depositing films with minimal impurity contents are determined, the possibility of preparing layers with a fractal-like surface structure is demonstrated. The growth rate of the sample in the presence of hydrogen is shown to reach 3.2 nm/min. The regimes for the precipitation of functional layers on electrode contacts (capacitance values of 2.2-9.2 µF/cm2) and on Ti discs are determined.
KW - chemical vapor deposition
KW - electrochemically active surface area
KW - film structure
KW - platinum
KW - SURFACE-AREA
KW - STIMULATION/SENSING MATERIALS
KW - PLATINUM
KW - ELECTRODES
KW - IR
KW - NEURAL STIMULATION
KW - ELECTROCHEMICAL-BEHAVIOR
KW - PRECURSORS
KW - IRIDIUM OXIDE
UR - http://www.scopus.com/inward/record.url?scp=85091266884&partnerID=8YFLogxK
U2 - 10.1134/S0022476620080053
DO - 10.1134/S0022476620080053
M3 - Article
AN - SCOPUS:85091266884
VL - 61
SP - 1211
EP - 1218
JO - Journal of Structural Chemistry
JF - Journal of Structural Chemistry
SN - 0022-4766
IS - 8
ER -
ID: 25677729