Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференций › статья в сборнике материалов конференции › научная › Рецензирование
Shapes of Ge and Si Particles Created on a Si/SiO2Substrate by Lift-off Technique. / Utkin, Dmitriy; Shklyaev, Alexander.
2021 IEEE 22nd International Conference of Young Professionals in Electron Devices and Materials, EDM 2021 - Proceedings. IEEE Computer Society, 2021. стр. 33-36 9507661 (International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM; Том 2021-June).Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференций › статья в сборнике материалов конференции › научная › Рецензирование
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TY - GEN
T1 - Shapes of Ge and Si Particles Created on a Si/SiO2Substrate by Lift-off Technique
AU - Utkin, Dmitriy
AU - Shklyaev, Alexander
N1 - Electron lithography was carried out using the equipment of CKP “VTAN” in the ATRC department of NSU. The equipment of CKP “NANOSTRUKTURY” was also used for the investigated structures fabrication. Publisher Copyright: © 2021 IEEE.
PY - 2021/6/30
Y1 - 2021/6/30
N2 - The development of photonic devices based on the use of coatings that consist of ordered dielectric particle arrays is determined by the need to reduce their energy consumption and increase their efficiency. Unlike perforated metal coatings commonly used to control light intensity in optoelectronic structures, dielectric coatings result in a significantly less light dissipation. We develop a method for obtaining an ordered dielectric particle array without using the etching process. The method is based on the use of electronic lithography with the removal of excess material by 'explosion', that is by the lift-off method. We obtained arrays of Ge and Si particles sized from 100 to 400 nm on silicon substrates. It was found that the particle shape is determined by both the slope of the hole walls in the electron resist and the deposited material flow direction.
AB - The development of photonic devices based on the use of coatings that consist of ordered dielectric particle arrays is determined by the need to reduce their energy consumption and increase their efficiency. Unlike perforated metal coatings commonly used to control light intensity in optoelectronic structures, dielectric coatings result in a significantly less light dissipation. We develop a method for obtaining an ordered dielectric particle array without using the etching process. The method is based on the use of electronic lithography with the removal of excess material by 'explosion', that is by the lift-off method. We obtained arrays of Ge and Si particles sized from 100 to 400 nm on silicon substrates. It was found that the particle shape is determined by both the slope of the hole walls in the electron resist and the deposited material flow direction.
KW - dielectric particles
KW - film deposition
KW - germanium
KW - lift-off
KW - lithography
KW - semiconductors
KW - silicon
UR - http://www.scopus.com/inward/record.url?scp=85113554713&partnerID=8YFLogxK
UR - https://www.mendeley.com/catalogue/23a67732-c782-315a-917e-890bff66b3b8/
U2 - 10.1109/EDM52169.2021.9507661
DO - 10.1109/EDM52169.2021.9507661
M3 - Conference contribution
AN - SCOPUS:85113554713
SN - 9781665414982
T3 - International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices, EDM
SP - 33
EP - 36
BT - 2021 IEEE 22nd International Conference of Young Professionals in Electron Devices and Materials, EDM 2021 - Proceedings
PB - IEEE Computer Society
T2 - 22nd IEEE International Conference of Young Professionals in Electron Devices and Materials, EDM 2021
Y2 - 30 June 2021 through 4 July 2021
ER -
ID: 34914244