Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференций › статья в сборнике материалов конференции › научная › Рецензирование
Potassium titanyl phosphate sputtering features by argon cluster ions. / Nikolaev, Ivan; Korobeishchikov, Nikolay; Roenko, Maxim.
Proceedings - 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020. Institute of Electrical and Electronics Engineers Inc., 2020. стр. 526-528 9242181 (Proceedings - 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020).Результаты исследований: Публикации в книгах, отчётах, сборниках, трудах конференций › статья в сборнике материалов конференции › научная › Рецензирование
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TY - GEN
T1 - Potassium titanyl phosphate sputtering features by argon cluster ions
AU - Nikolaev, Ivan
AU - Korobeishchikov, Nikolay
AU - Roenko, Maxim
N1 - Funding Information: ACKNOWLEDGMENT The work was supported by the Ministry of Education and Science of the Russian Federation under grant No. 2019-1085 and carried out with the help of CKP “Applied physics” of NSU. Publisher Copyright: © 2020 IEEE. Copyright: Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2020/9/14
Y1 - 2020/9/14
N2 - In this paper, we consider features of changes in surface morphology of potassium titanyl phosphate single crystal at the treatment of the argon cluster ion beam. It demonstrated that the sputtering process of the target surface at the small energy per atom in the cluster leads to a subnanometer level of the surface roughness. The sputtering yields and etching rates of potassium titanyl phosphate have been determined for small energy per atom in the argon cluster. We analyze the complex characteristic of surface quality is the power spectral density function of surface roughness for studying the surface smoothing effect of KTP single crystals by argon cluster ions.
AB - In this paper, we consider features of changes in surface morphology of potassium titanyl phosphate single crystal at the treatment of the argon cluster ion beam. It demonstrated that the sputtering process of the target surface at the small energy per atom in the cluster leads to a subnanometer level of the surface roughness. The sputtering yields and etching rates of potassium titanyl phosphate have been determined for small energy per atom in the argon cluster. We analyze the complex characteristic of surface quality is the power spectral density function of surface roughness for studying the surface smoothing effect of KTP single crystals by argon cluster ions.
KW - Atomic force microscopy (AFM)
KW - Cluster ion beam
KW - Potassium titanyl phosphate (KTP)
KW - Power spectral density (PSD)
KW - Smoothing
KW - Sputtering
KW - Subnanometer roughness
UR - http://www.scopus.com/inward/record.url?scp=85097632383&partnerID=8YFLogxK
U2 - 10.1109/EFRE47760.2020.9242181
DO - 10.1109/EFRE47760.2020.9242181
M3 - Conference contribution
AN - SCOPUS:85097632383
T3 - Proceedings - 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020
SP - 526
EP - 528
BT - Proceedings - 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020
Y2 - 14 September 2020 through 26 September 2020
ER -
ID: 27119370